Mr. Hoyoung Heo Profile

Hoyoung Heo

at KLA Texas

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 28 March 2017 Presentation + Paper

Patterned wafer geometry grouping for improved overlay control

Honggoo Lee, Sangjun Han, Jaeson Woo, Junbeom Park, Changrock Song, Fatima Anis, Pradeep Vukkadala, Sanghuck Jeon, DongSub Choi, Kevin Huang, Hoyoung Heo, Mark Smith, John Robinson

Proceedings Volume 10145, 101450O (2017) https://doi.org/10.1117/12.2257834

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Process control, Optical lithography, Semiconductor manufacturing, Control systems, Inspection, Tolerancing, Manufacturing, Seaborgium, Semiconductors, Optical alignment, Principal component analysis

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Proceedings Article | 28 March 2017 Presentation + Paper

High-volume manufacturing device overlay process control

Honggoo Lee, Sangjun Han, Jaeson Woo, DongYoung Lee, ChangRock Song, Hoyoung Heo, Irina Brinster, DongSub Choi, John Robinson

Proceedings Volume 10145, 101450D (2017) https://doi.org/10.1117/12.2257836

KEYWORDS: Overlay metrology, Process control, Metrology, Scanning electron microscopy, Inspection, Control systems, High volume manufacturing, Semiconductor manufacturing, Optical inspection, Optics manufacturing, Semiconducting wafers, Data modeling, Scanners

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Proceedings Article | 18 March 2016 Paper

Application of overlay modeling and control with Zernike polynomials in an HVM environment

JaeWuk Ju, MinGyu Kim, JuHan Lee, Jeremy Nabeth, Sanghuck Jeon, Hoyoung Heo, John Robinson, Bill Pierson

Proceedings Volume 9778, 977825 (2016) https://doi.org/10.1117/12.2219739

KEYWORDS: Overlay metrology, Zernike polynomials, Process control, Yield improvement, Metrology, Scanners, Image processing, Optical lithography, Control systems, Semiconducting wafers, High volume manufacturing, Data modeling

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Proceedings Article | 18 March 2016 Paper

Device overlay method for high volume manufacturing

Honggoo Lee, Sangjun Han, Youngsik Kim, Myoungsoo Kim, Hoyoung Heo, Sanghuck Jeon, DongSub Choi, Jeremy Nabeth, Irina Brinster, Bill Pierson, John Robinson

Proceedings Volume 9778, 97781F (2016) https://doi.org/10.1117/12.2219701

KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Inspection, High volume manufacturing, Image processing, Process control, Optical lithography, Control systems, Optical metrology, Semiconducting wafers, Data modeling, Transparency

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