Yevgeny Lifshitz, Jeffrey Wood, David Novack, Jack Downey, Dinay Dash, Shiladitya Chakravorty, Michael Raga-Barone, Taher Kagalwala, Alfred Hajtman, John Byrnes, Csaba Nándor Bitvai, Anna Bölcskei-Molnár, Peter Basa
The metrology FOUP (M-FOUP) is a self-contained metrology tool in a wafer carrier. This metrology concept, which was designed and manufactured by SEMILAB, is actively being evaluated in GLOBALFOUNDRIES. The M-FOUP system consists of a controller (MCONTROLLER), which controls multiple M-FOUP measurement units. Each independently operated M-FOUP unit utilizes a multi-point spectroscopic reflectometry technique, which can be used for many thickness applications. The self-contained metrology device has advantages over traditional film thickness measurement tools including reduced cost, significantly smaller footprint, and increased availability. In a previous article we focused on the technical details of the M-FOUP unit such as the overall design, the temperature distribution, charging/discharging routine, typical spectra, and typical wafer map. The focus of this work is on integrating the M-FOUP system into a semiconductor fab environment. This requires a high-level orchestration of multiple fab systems including the automated material handling system (AMHS), real-time dispatching (RTD) system and the MFOUP system itself. The management of the metrology jobs and data collection using M-FOUP from a point of view of Manufacturing Execution System (MES) are discussed.
In this work, the SEMI specification for reticle and pod management (E109) with internal reticle library support has been
integrated for the first time on KLA-Tencor’s TeronTM and TeraScanTM reticle inspection tools. Manufacturing
Execution System scheduling reticle jobs and Automated Material Handling System scheduling to transfer pods
simultaneously have also been integrated and tested. GLOBALFOUNDRIES collaboratively worked with KLA-Tencor
to successfully implement these capabilities. Both library and non-library scenarios have been demonstrated for
comparison in a real production environment resulting in productivity increase of approximately 29% by making use of
the library. Reticle re-qualification test cases were used for the comparison in this work.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.