Mr. Jeffrey E. Nelson Profile

Jeffrey E. Nelson

at Cadence Design Systems Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 11 April 2024 Presentation + Paper

In-design DFM pattern optimization with ML models for dynamic fixing guidance selection and implementation

Fadi Batarseh, Piyush Pathak, Jac Condella, Keerthana Bhoopanam, Jeff Nelson, Lynn Wang, Ya-Chieh Lai

Proceedings Volume 12954, 1295406 (2024) https://doi.org/10.1117/12.3023887

KEYWORDS: Design for manufacturing, Design, Machine learning, Mathematical optimization, Manufacturing, Design for manufacturability, Education and training, Process modeling, Histograms, Electronic design automation

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Proceedings Article | 26 May 2022 Presentation + Paper

Dynamic pattern match searching flow to enable precise hotspot detection

Fadi Batarseh, Uwe Paul Schroeder, Jeff Nelson, Piyush Pathak, Wei-Long Wang, Ya-Chieh Lai

Proceedings Volume 12052, 120520O (2022) https://doi.org/10.1117/12.2617261

KEYWORDS: Data modeling, Machine learning, Silicon, Feature extraction, Optical proximity correction, Metals, Fuzzy logic, Profiling, Databases, Data processing

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Proceedings Article | 22 February 2021 Poster + Paper

Fast, high-capacity critical area analysis (CAA) with advanced FINFET defectivity calculation

Xiaoyuan Qi, Atul Chittora, Aaron Sinnott, Binod Kumar G. Nair, Shobhit Malik, Jeffrey Nelson, Jac Condella, Jonathan Fales, Rwik Sengupta, Ya-Chieh Lai, Frank Gennari, Philippe Hurat

Proceedings Volume 11614, 1161413 (2021) https://doi.org/10.1117/12.2583515

KEYWORDS: Fin field effect transistors, Transistors, Semiconductors, High volume manufacturing, Databases, Data modeling

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Proceedings Article | 22 February 2021 Presentation + Paper

Fadi Batarseh, Uwe Paul Schroeder, Jeff Nelson, Ya-Chieh Lai, Piyush Pathak, Sriram Madhavan, Philippe Hurat

Proceedings Volume 11614, 1161409 (2021) https://doi.org/10.1117/12.2586112

KEYWORDS: Profiling, Tolerancing, Silicon, Manufacturing, Visualization, Semiconducting wafers, Lithography, Inspection, Design for manufacturability

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Proceedings Article | 18 March 2019 Presentation

Pattern-aware diagnostics: using high-performance pattern analysis to identify defect root cause (Conference Presentation)

Jason Cain, Abdullah Yassine, Moutaz Fakhry, Piyush Pathak, Jeffrey Nelson, Frank Gennari, Ya-Chieh Lai

Proceedings Volume 10962, 1096209 (2019) https://doi.org/10.1117/12.2516571

KEYWORDS: Diagnostics, Failure analysis, Machine learning, Feature extraction, Inspection, High volume manufacturing, Silicon

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