Mr. Kiminori Yoshino Profile

Kiminori Yoshino

at Toshiba Corp

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 2 April 2010 Paper

New exposure tool management technology with quick focus measurement in half pitch 22nm generation

Kazuhiko Fukazawa, Toshiaki Kitamura, Shinsuke Takeda, Yoshihiko Fujimori, Yuji Kudo, Shigeru Hirukawa, Kengo Takemasa, Noriaki Kasai, Yuuichiro Yamazaki, Kiminori Yoshino

Proceedings Volume 7638, 763806 (2010) https://doi.org/10.1117/12.846329

KEYWORDS: Semiconducting wafers, Diffraction, Scanners, Reticles, Calibration, Overlay metrology, Wafer-level optics, Critical dimension metrology, Image analysis

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Proceedings Article | 2 April 2010 Paper

New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, Kazumasa Endo, Kiminori Yoshino, Yuuichiro Yamazaki, Kuniharu Nagashima, Kenji Tsuchiya

Proceedings Volume 7638, 76380E (2010) https://doi.org/10.1117/12.846336

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Birefringence, Reflectivity, Photoresist materials, Polarization, Objectives, Astronomical imaging, Semiconductors

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Proceedings Article | 2 April 2010 Paper

Advanced lithography: wafer defect scattering analysis at DUV

Doron Meshulach, Ido Dolev, Yuuichiro Yamazaki, Kenji Tsuchiya, Makoto Kaneko, Kiminori Yoshino, Takayoshi Fujii

Proceedings Volume 7638, 76380K (2010) https://doi.org/10.1117/12.848326

KEYWORDS: Scattering, Light scattering, Deep ultraviolet, Polarization, Semiconducting wafers, Inspection, Ultraviolet radiation, Lithography, Bridges, Visible radiation

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Proceedings Article | 24 March 2009 Paper

Hole inspection technology using Fourier imaging method

Kiminori Yoshino, Kenji Tsuchiya, Yuuichiro Yamazaki, Makoto Oote, Koichiro Shibayama, Akitoshi Kawai, Kazumasa Endo

Proceedings Volume 7272, 72723H (2009) https://doi.org/10.1117/12.813634

KEYWORDS: Semiconducting wafers, Diffraction, Polarizers, Inspection, Critical dimension metrology, Objectives, Image analysis, Polarization, Photoresist materials, Process control

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Proceedings Article | 24 March 2009 Paper

Development of optical simulation tool for defect inspection

Takayoshi Fujii, Yusaku Konno, Naotada Okada, Kiminori Yoshino, Yuuichiro Yamazaki

Proceedings Volume 7272, 72721A (2009) https://doi.org/10.1117/12.812472

KEYWORDS: Inspection, Polarization, Near field optics, Defect inspection, Finite-difference time-domain method, Dielectrics, Defect detection, Optical inspection, Near field, Optical simulations

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Proceedings Article | 23 March 2009 Paper

Two-dimensional dose and focus-error measurement technology for exposure tool management in half-pitch 3x generation

Kazuhiko Fukazawa, Yuji Kudo, Yoshihiko Fujimori, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 7272, 72721I (2009) https://doi.org/10.1117/12.813937

KEYWORDS: Line edge roughness, Critical dimension metrology, Semiconducting wafers, Polarization, Inspection, Wafer testing, Scanning electron microscopy, Defect detection, Wafer-level optics

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Proceedings Article | 23 March 2009 Paper

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Akitoshi Kawai, Fuminori Hayano, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 7272, 727219 (2009) https://doi.org/10.1117/12.814046

KEYWORDS: Diffraction, Semiconducting wafers, Critical dimension metrology, Inspection, Optical simulations, Wafer testing, Wafer-level optics, Polarization, Birefringence

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Proceedings Article | 24 March 2008 Paper

Novel CD inspection technology leveraging a form birefringence in a Fourier space

Akitoshi Kawai, Daisaku Mochida, Kiminori Yoshino, Yuuichiro Yamazaki

Proceedings Volume 6922, 69221X (2008) https://doi.org/10.1117/12.771889

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Inspection, Birefringence, Polarization, Polarizers, Scanning electron microscopy, Objectives, Edge roughness, Data modeling

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Proceedings Article | 5 April 2007 Paper

Novel technology of automatic macro inspection for 32-nm node and best focus detection

Kazuhiko Fukazawa, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 6518, 65182H (2007) https://doi.org/10.1117/12.711410

KEYWORDS: Inspection, Semiconducting wafers, Line edge roughness, Birefringence, Finite-difference time-domain method, Phase shifts, Polarization, Scanning electron microscopy, Image processing, Mirrors

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Proceedings Article | 10 May 2005 Paper

Novel inspection technology for half pitch 55 nm and below

Takeo Omori, Kazuhiko Fukazawa, Toru Mikami, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599178

KEYWORDS: Semiconducting wafers, Inspection, Reflectivity, Birefringence, Polarization, Image processing, Wafer testing, Dielectric polarization, Dielectrics

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Showing 5 of 10 publications

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