Mr. Koichi Moriizumi Profile

Koichi Moriizumi

Managing Director at Lasertec Corp

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Author

Publications (8)

Proceedings Article | 13 July 2017 Paper

Development of high sensitivity and high speed large size blank inspection system LBIS

Shinobu Ohara, Akinori Yoshida, Mitsuo Hirai, Takenori Kato, Koichi Moriizumi, Haruhiko Kusunose

Proceedings Volume 10454, 1045402 (2017) https://doi.org/10.1117/12.2284332

KEYWORDS: Inspection, Photomasks, Light scattering, Organic light emitting diodes, Digital image correlation, Manufacturing, Laser development, Optics manufacturing, LCDs, Particles

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Proceedings Article | 10 April 2013 Paper

Productivity improvement through automated operation of reticle defect inspection tools in a wafer fab environment

Christian Holfeld, Heiko Wagner, Anna Tchikoulaeva, Steffen Loebeth, Stephan Melzig, Yulin Zhang, Shinichi Tanabe, Takenori Katoh, Koichi Moriizumi

Proceedings Volume 8681, 868126 (2013) https://doi.org/10.1117/12.2014480

KEYWORDS: Inspection, Reticles, Semiconducting wafers, Defect inspection, Photomasks, Manufacturing, Factory automation, Defect detection, Wafer manufacturing, Parallel processing

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Proceedings Article | 7 July 1997 Paper

Estimation of optical proximity effect caused by mask fabrication error

Kazuya Kamon, Tetsuro Hanawa, Koichi Moriizumi

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276045

KEYWORDS: Photomasks, Mask making, Error analysis, Optical proximity correction, Lithography, Spindles, Opacity, Beam shaping, Laser systems engineering, Binary data

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Proceedings Article | 31 October 1996 Paper

High-speed electron beam data verification system using high-performance neural network accelerator board

Toshiyuki Tamura, Dominique Bouchon, Pierre Fournier, Koichi Moriizumi, Ken-ichi Tanaka, Kazuo Kyuma

Proceedings Volume 2908, (1996) https://doi.org/10.1117/12.257257

KEYWORDS: Digital signal processing, Data conversion, Electron beams, Neural networks, Computer aided design, Raster graphics, Very large scale integration, Photomasks, Parallel processing, Inspection

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Proceedings Article | 24 July 1996 Paper

New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation

Hiroomi Nakao, Koichi Moriizumi, Kinya Kamiyama, Masayuki Terai, Hisaharu Miwa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245230

KEYWORDS: Solids, Photomasks, Silicon, Charge-coupled devices, Electron beams, Beam shaping, Tolerancing, Microelectronics, Mask making, Critical dimension metrology

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Proceedings Article | 7 June 1996 Paper

Fast and accurate optical proximity correction based on aerial image simulation

Tetsuro Hanawa, Kazuya Kamon, Akihiro Nakae, Shuji Nakao, Koichi Moriizumi

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240929

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Critical dimension metrology, Binary data, Diffraction, Optical lithography, Lithographic illumination, Imaging systems, Scanning electron microscopy

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Proceedings Article | 3 July 1995 Paper

Optical proximity correction for super-resolution technique

Kazuya Kamon, Wataru Wakamiya, Hitoshi Nagata, Koichi Moriizumi, Teruo Miyamoto, Yasuhito Myoi, Masaaki Tanaka

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212792

KEYWORDS: Optical proximity correction, Photomasks, Super resolution, Data conversion, Computer aided design, Parallel processing, Diffraction, Lithium, Electron beams, Photoresist processing

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Proceedings Article | 1 June 1990 Paper

Advanced 5x reticle inspection technologies for ULSI devices

Susumu Takeuchi, David Joseph, Miyoshi Yoshida, Koichi Moriizumi, Donald Parker, Yaichiro Watakabe

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20046

KEYWORDS: Inspection, Databases, Reticles, Image resolution, Data conversion, Defect detection, Integrated circuits, Metrology, Process control, Raster graphics

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Showing 5 of 8 publications

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