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Kuei-Shu Chang-Liao
at National Tsing Hua Univ
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 1 July 2003 Paper
Chemical dry cleaning and pretreatment on the electrical and reliability characteristic of high-k gate dielectrics in MOS device
Chin-Lung Cheng, Tien-Ko Wang, Kuei-Shu Chang-Liao
Proceedings Volume 4999, (2003) https://doi.org/10.1117/12.475404
KEYWORDS: Oxides, Interfaces, Dry etching, Silicon, Etching, Dielectrics, Metals, Plasma etching, Plasma, Molybdenum
Conference Committee Involvement (1)
Quantum Sensing: Evolution and Revolution from Past to Future
27 January 2003 | San Jose, CA, United States
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