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Dr. Lin Chen
Senior Engineer at Intel Corp
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Publications (1)
Proceedings Article | 20 October 2006 Paper
Mask specification for for wafer process optimization
Lin Chen, Phil Freiberger, Jeff Farnsworth, Ruth Stritsman, Richard Rodrigues
Proceedings Volume 6349, 634917 (2006) https://doi.org/10.1117/12.686610
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Tolerancing, Binary data, Lithography, Scanning electron microscopy, Reticles, Metrology
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