Prof. Min-Jui Huang Profile

Prof. Min-Jui Huang

Associate Professor at National Chung Hsing Univ

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Publications (5)

SPIE Journal Paper | 8 May 2015

Isochromatic photoelastic phase map unwrapping: temporal versus spatial approach

Jing-Tai Wu, Min-Jui Huang

OE, Vol. 54, Issue 08, 081207, (May 2015) https://doi.org/10.1117/12.10.1117/1.OE.54.8.081207

KEYWORDS: Photoelasticity, Error analysis, Phase shifts, Optical engineering, Digital photography, Fringe analysis, Holography, Digital video recorders, Birefringence, Parallel processing

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Proceedings Article | 15 April 2010 Paper

Phase unwrapping work of photoelastic stress analysis

M. Huang, P. Sung, H. An

Proceedings Volume 7522, 752253 (2010) https://doi.org/10.1117/12.851550

KEYWORDS: Photoelasticity, Phase shifting, Stress analysis, Ranging, Error analysis, Charge-coupled devices, Light sources, Bismuth, Data modeling, Birefringence

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SPIE Journal Paper | 1 April 2005

Histogram-data-orientated filter for inconsistency removal of interferometric phase maps

Min Huang, Wen-Hung Sheu

OE, Vol. 44, Issue 04, 045602, (April 2005) https://doi.org/10.1117/12.10.1117/1.1881372

KEYWORDS: Digital filtering, Optical filters, Optical engineering, Interferometry, Speckle pattern, Phase retrieval, Phase interferometry, Speckle, Computer simulations, Linear filtering

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SPIE Journal Paper | 1 June 2002

Innovative phase unwrapping algorithm: hybrid approach

Min Huang, Cian-Jhih Lai

OE, Vol. 41, Issue 06, (June 2002) https://doi.org/10.1117/12.10.1117/1.1477441

KEYWORDS: Floods, Optical engineering, Computer simulations, Phase shifts, Image processing, Interferometry, Algorithm development, Holography, Speckle pattern, Phase measurement

Proceedings Article | 25 March 1996 Paper

Large-format grating image hologram based on e-beam lithography

Min Huang, S. Yeh, Chih-Kung Lee, T. Huang

Proceedings Volume 2652, (1996) https://doi.org/10.1117/12.236052

KEYWORDS: Holograms, Diffraction gratings, Electron beam lithography, Optical design, Light sources, Light, Wavefronts, Image quality, Photoresist materials, Semiconductors

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The e-beam lithography commonly used in the semiconductor industry is used to create large format grating image holograms. Delicate and bright images with extremely fine features can be generated using this newly developed method. In this paper, a quantitative and qualitative analysis related to the grating image hologram is discussed in detail. Using the optimized condition derived based on the quantitative analysis, the e-beam lithography technique commonly used to generate semiconductor masks has been implemented to create images with extremely fine features. The optimized condition together with the simplistic nature of the grating written to the image, the grating image holograms generated will be bright and colorful under white light illumination. The above mentioned generic characteristics plus the optimized condition obtained from our analysis make the e-beam lithography technique a versatile and powerful method in creating image holograms. High end products such as kinegrams can be easily implemented by using this technique. Furthermore, kinegrams with extremely fine features to generate a continuous and smooth imaging effect can be effectively created by this newly developed technique. The orientation and the pitch of the grating written to the grating image hologram determines two important characteristics of the grating image. More specifically, the grating orientation determines the viewing angle while the grating pitch determines the color projected to the viewer. As the grating image hologram is typically being illuminated by an inclined incident white light, the incident light beams will be diffracted into a colorful curved surface extending from the illuminated grating pixel. Taking a realistic extended illuminating light source into consideration, a single grating pixel actually will diffract the illuminating light cone into a colorful surface ensemble. With this understanding, it is possible for us to design the grating image hologram using the colorful surface ensemble as one of the design parameters available to us. In other words, we can use the colorful surface ensemble to shape the final image created by illuminating the grating image hologram with prespecific extended white light conditions. Two grating image holograms, one of which is a 5 by 5 centimeters square grating and the other a 3.5 centimeters by 2 centimeters elliptical kinegram, were successfully created by utilizing the analysis mentioned above. It was discovered that the limitation of the field size available to today's e-beam machine poses an important design consideration. That is, when field stitching is required to create a large area grating image hologram, the images being written should be carefully chosen so as to minimize the mismatch effect among the junction of each field. The two newly completed holograms showed that with the design methodology presented in this article, high quality large area grating image holograms can be created.

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