Mr. Naoki Man Profile

Naoki Man

at Toray Research Ctr Inc

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Author

Publications (6)

Proceedings Article | 20 March 2015 Paper

Measurement of acid diffusion from PAG in photoresists by using TOF-SIMS with GCIB

Naoki Man, Atsushi Sekiguchi, Yoko Matsumoto

Proceedings Volume 9425, 94251H (2015) https://doi.org/10.1117/12.2085814

KEYWORDS: Diffusion, Thin film coatings, Photoresist materials, Ions, Etching, Silicon, Polymers, Profiling, Photoresist processing, Ion beams

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Proceedings Article | 20 March 2015 Paper

Novel thin film analysis to investigate actual film formation

Kazunori Sakai, Kenji Mochida, Shinichi Nakamura, Tooru Kimura, Kazuhiro Yoshikawa, Naoki Man, Hirofumi Seiki, Masaaki Takeda

Proceedings Volume 9425, 942522 (2015) https://doi.org/10.1117/12.2085717

KEYWORDS: Oxygen, Fluorine, Etching, Process control, Distortion, Photoresist materials, Hydrogen, Thin films, Carbon, Profiling

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Proceedings Article | 27 March 2014 Paper

Photoresist analysis to investigate LWR generation mechanism

Kenji Mochida, Shinichi Nakamura, Tooru Kimura, Kazuki Kawai, Yoshihiko Taguchi, Naoki Man, Hideki Hashimoto

Proceedings Volume 9051, 90511Q (2014) https://doi.org/10.1117/12.2045864

KEYWORDS: Photoresist materials, Line width roughness, Polymers, Lithography, Chemical analysis, Semiconducting wafers, Photoresist processing, Optical lithography, Lithographic illumination, Immersion lithography

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Proceedings Article | 29 March 2013 Paper

Photoresist film analysis to investigate LWR generation mechanism

Shinichi Nakamura, Kenji Mochida, Tooru Kimura, Kana Nakanishi, Naohiko Kawasaki, Naoki Man

Proceedings Volume 8682, 86821H (2013) https://doi.org/10.1117/12.2011394

KEYWORDS: Photoresist materials, Diffusion, Line width roughness, Lithography, Coating, Ions, Photoresist processing, Chemical analysis, Polymers, Transmission electron microscopy

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Proceedings Article | 1 April 2009 Paper

Defect reduction in non-topcoat resist by selective segregation removal step

Takuya Hagiwara, Mamoru Terai, Takeo Ishibashi, Tomofumi Miyauchi, Shinya Hori, Teruhiko Kumada, Tomoya Kumagai, Atsushi Sawano, Kosuke Doi, Takeshi Matsunobe, Naoki Man, Hirofumi Seki, Yusaku Tanahashi, Tetsuro Hanawa

Proceedings Volume 7273, 727324 (2009) https://doi.org/10.1117/12.813643

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

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Proceedings Article | 2 April 2007 Paper

Mechanism of immersion specific defects with high receding-angle topcoat

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Takuya Hagiwara, Tetsuro Hanawa, Tomoyuki Ando, Takeshi Matsunobe, Kazuyuki Okada, Yuichi Muraji, Kazuhiro Yoshikawa, Naoki Man

Proceedings Volume 6519, 65191S (2007) https://doi.org/10.1117/12.711058

KEYWORDS: Water, Bridges, Immersion lithography, Semiconducting wafers, Digital watermarking, Surface properties, Polymers, Chemical analysis, Defect inspection, Standards development

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Showing 5 of 6 publications

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