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Noboru Otsuka
at JSR Micro NV
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Publications (1)
Proceedings Article | 21 March 2012 Paper
Ultimate lithographic performances of advanced resists CAR or non-CAR resist?
Jan Frederik Van Steenbergen, Noboru Ootsuka, Xavier Buch, Béatrice Icard, Claire Sourd, Christophe Constancias, Bernard Dalzotto, Laurent Pain
Proceedings Volume 8323, 83232M (2012) https://doi.org/10.1117/12.916624
KEYWORDS: Photoresist materials, Lithography, Line width roughness, Electron beam lithography, Extreme ultraviolet, Chemically amplified resists, Electron beams, Semiconducting wafers, Silicon, Chemistry
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