An effective economic viability that uses micro electroremoval as a reclaim system was developed to remove the
defective ITO nanostructure coatings from the optical PET surfaces of digital paper. The low yield of ITO thin film
deposition is an important factor in semiconductor production. By establishing the reclaim process using the ultra-precise
removal of the nanostructure coatings, the optoelectronic semiconductor industry can effectively reclaim defective
products, minimizing both production costs and pollution. In the current experiment, a large lath-shaped cathode with a
small gap-width between the cathode and the workpiece takes less time for the same amount of ITO removal. A small
end radius of the cathode combines with enough electric power to drive fast machining. Pulsed direct current can
improve the effect of dreg discharge, and it is advantageous to associate the workpiece with the fast feed rate. However,
this improvement can increase the current rating. A high rotational speed of the electrodes, a higher temperature, or a
large flow rate of the electrolyte corresponds to a higher removal rate for the ITO nanostructure. The micro
electroremoval requires only a short period of time to remove the ITO thin film coatings easily and cleanly.
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