Mr. Richer Yang Profile

Richer Yang

at Micron Technology Taiwan Inc

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Author

Publications (6)

Proceedings Article | 28 March 2017 Presentation + Paper

Wafer hot spot identification through advanced photomask characterization techniques: part 2

Yohan Choi, Michael Green, Young Cho, Young Ham, Howard Lin, Andy Lan, Richer Yang, Mike Lung

Proceedings Volume 10148, 101480L (2017) https://doi.org/10.1117/12.2257676

KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, SRAF, Optical proximity correction, 3D metrology, Metrology, Critical dimension metrology, Finite element methods, Scanning electron microscopy, Yield improvement

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Proceedings Article | 5 October 2016 Paper

Wafer hot spot identification through advanced photomask characterization techniques

Yohan Choi, Michael Green, Jeff McMurran, Young Ham, Howard Lin, Andy Lan, Richer Yang, Mike Lung

Proceedings Volume 9985, 998521 (2016) https://doi.org/10.1117/12.2248678

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, 3D modeling, Optical proximity correction, Manufacturing, Metrology, Finite element methods, Mask making, Lithography

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Proceedings Article | 8 March 2016 Paper

Metrology target design (MTD) solution for diagonally orientated DRAM layer

Myungjun Lee, Mark Smith, Michael Adel, Chia-Hung Chen, Chin-Chang Huang, Hao-Lun Huang, Hsueh-Jen Tsai, I-Lin Wang, Jen-Chou Huang, Jo-Lan Chin, Kuo-Yao Chou, Yuan-Ku Lan, Hsien-Yen Lung, Jui-Chin Yang, Tal Itzkovich, Healthy Huang, Yaniv Abramovitz, Jinyan Song, Chen Dror, Harvey Cheng, Ady Levy

Proceedings Volume 9778, 97782R (2016) https://doi.org/10.1117/12.2218659

KEYWORDS: Personal protective equipment, Metrology, Lithography, Overlay metrology, Photomasks, Scanners, Lithographic illumination, SRAF, Neodymium, Optical proximity correction

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Proceedings Article | 12 December 2009 Paper

Overlay improvement by ASML HOWA 5th alignment strategy

Raf Wang, CY Chiang, Wilson Hsu, Richer Yang, Todd Shih, Jackie Chen, Jonathan Chiu, Wythe Lin

Proceedings Volume 7520, 752023 (2009) https://doi.org/10.1117/12.839816

KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Front end of line, Lithography, Scanners, Capacitance, Current controlled current source, Yield improvement

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Proceedings Article | 4 December 2008 Paper

Throughput improvement from routing reduction by using CPE (correction per exposure)

Ray Chang, Jui-Chin Yang, Chia-Hung Chen, Chi-Chun Lin, Cathy Wang, Wythe Lin, Chia-Chi Chen

Proceedings Volume 7140, 714043 (2008) https://doi.org/10.1117/12.806643

KEYWORDS: Semiconducting wafers, Scanners, Etching, Overlay metrology, Optical alignment, Yield improvement, Lithography, Current controlled current source, Samarium, Time metrology

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Proceedings Article | 24 March 2008 Paper

Overlay improvement by zone alignment strategy

Chun-Yen Huang, Ai-Yi Lee, Chiang-Lin Shih, Richer Yang, Michael Yuan, Henry Chen, Ray Chang

Proceedings Volume 6922, 69221G (2008) https://doi.org/10.1117/12.772520

KEYWORDS: Optical alignment, Semiconducting wafers, Yield improvement, Front end of line, Lithography, Overlay metrology, Process control, Capacitance, Metrology, Inspection

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Showing 5 of 6 publications

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