Dr. Sangsul Lee Profile

Dr. Sangsul Lee

at Paul Scherrer Institut

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Publications (2)

Proceedings Article | 17 April 2014 Open Access

A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source (Withdrawal Notice)

Sangsul Lee, Manuel Guizar-Sicairos, Yasin Ekinci

Proceedings Volume 9048, 904811 (2014) https://doi.org/10.1117/12.2046226

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Inspection, Diffraction, Sensors, Light sources, Charge-coupled devices, CCD image sensors

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Proceedings Article | 21 March 2008 Paper

The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect

Chang Young Jeong, Byung Hun Kim, Tae Geun Kim, Sangsul Lee, Eun Jin Kim, Hye-Keun Oh, In-Sung Park, Jinho Ahn

Proceedings Volume 6921, 69213Q (2008) https://doi.org/10.1117/12.772533

KEYWORDS: Reflectivity, Photomasks, Critical dimension metrology, Binary data, Phase shifts, Extreme ultraviolet lithography, Molybdenum, Extreme ultraviolet, Deep ultraviolet, Image processing

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