Dr. Sangwoong Yoon Profile

Dr. Sangwoong Yoon

at Samsung Electronics Co Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 28 June 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Lee, Seok Han, Kyoung Park, Sangwoong Yoon, Hye Kang, Hyun Oh, Ji Lee, Young Kim, Tae Kim, Hye-Keun Oh

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617210

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

Read Abstract +

Proceedings Article | 4 May 2005 Paper

New polymer platform of BARC for ArF lithography

Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki Nakajima, SangMun Chon, YoungHo Kim, Sangwoong Yoon, Seok Han, YoungHoon Kim, EunYoung Yoon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599421

KEYWORDS: Etching, Polymers, Lithography, Reflectivity, Semiconducting wafers, Silicon, Sensors, Polymerization, Control systems, Photoresist materials

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Analysis of solvent effect to control the BARC coating uniformity

Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Myungsun Kim, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924

KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Influence of activation energy on LER in chemically amplified KrF photoresists

Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880

KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Impact of BARC on SEM shrinkage of ArF resist

Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884

KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Influence of resin properties to resist performance at ArF lithography

Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950

KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Thin film type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Keisuke Nakayama, Kenichi Mizusawa, Yasuyuki Nakajima, Sangwoong Yoon, Yong-Hoon Kim, Young-Ho Kim, Hoesik Chung, Sang Mun Chon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485060

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Lithography, Coating, Plasma etching, Bottom antireflective coatings, Thin films

Read Abstract +

Proceedings Article | 23 June 2000 Paper

New development of cost-effective sub-0.18-um lithography with i-line

Hoesik Chung, Jinhang Jung, Youngsun Kim, KwangSoek Choi, NamHee Yoo, Sangwoong Yoon, JeEung Park

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388334

KEYWORDS: Ultraviolet radiation, Lithography, Photoresist processing, Critical dimension metrology, Deep ultraviolet, Phase shifts, Photomasks, Photoresist materials, Defect detection, Scanning electron microscopy

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years