Dr. Vardhineedi Sri Venkata Satyanarayana Profile

Dr. Vardhineedi Sri Venkata Satyanarayana

at Indian Institute of Technology Mandi

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 16 October 2014

Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

Vikram Singh, Vardhineedi Sri Venkata Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder Sharma, Felipe Kessler, Francine Scheffer, Daniel Weibel, Subrata Ghosh, Kenneth Gonsalves

JM3, Vol. 13, Issue 04, 043002, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043002

KEYWORDS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Extreme ultraviolet, Electron beam lithography, Etching, Line edge roughness, Resistance, Silicon, Lithography

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Optimization of processing parameters and metrology for novel NCA negative resists for NGL

Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine Scheffer, Daniel Weibel, Satinder Sharma, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 9048, 90481Y (2014) https://doi.org/10.1117/12.2045882

KEYWORDS: Etching, Electron beam lithography, Resistance, Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Thin films, Lithography, Surface roughness, Silicon

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Design and synthesis of novel resist materials for EUVL

V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth Gonsalves

Proceedings Volume 9048, 90481W (2014) https://doi.org/10.1117/12.2045736

KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymers, Polymerization, Silicon, Semiconducting wafers, Electron beam lithography, Line edge roughness, Scanning electron microscopy

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Organic-inorganic hybrid resists for EUVL

Vikram Singh, Vishwanath Kalyani, V. S. Satyanarayana, Chullikkattil Pradeep, Subrata Ghosh, Satinder Sharma, Kenneth Gonsalves

Proceedings Volume 9051, 90511W (2014) https://doi.org/10.1117/12.2041907

KEYWORDS: Polymethylmethacrylate, Photoresist materials, Polymers, Molybdenum, Medium wave, Extreme ultraviolet lithography, Etching, Resistance, Photoresist developing, Electron beam lithography

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Novel non-chemically amplified (n-CARs) negative resists for EUVL

Vikram Singh, V. S. Satyanarayana, Satinder Sharma, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 9051, 905106 (2014) https://doi.org/10.1117/12.2041183

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Extreme ultraviolet, Polymers, Chemically amplified resists, Etching, Lithography, Line edge roughness, Resistance, Photoresist materials

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years