Mr. Seung-Chul Oh Profile

Seung-Chul Oh

at ASML Korea Co Ltd

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Author

Publications (5)

Proceedings Article | 24 March 2017 Paper

Novel methodology to optimize wafer alignment to enhance 14nm on product overlay

Pavan Samudrala, Woong Jae Chung, Lokesh Subramany, Haiyong Gao, Nyan Aung, Seung Chul Oh, Shawn Lee, Erik Delvigne, Blandine Minghetti

Proceedings Volume 10147, 101471U (2017) https://doi.org/10.1117/12.2258137

KEYWORDS: Optical alignment, Overlay metrology, Scanners, Yield improvement, Lithium, Data modeling, Roads

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Proceedings Article | 4 December 2008 Paper

Lithography performance and simulation accuracy at different polarization states for sub 40nm node

Ki-Yeop Park, Ho-young Kang, Gratiela Isai, Khalid Elbattay, Peter van Oorschot, Stuart Young, Seung-Chul Oh, Young-Hong Min, Sung-Goo Hong, Youn-Tak Park

Proceedings Volume 7140, 71403N (2008) https://doi.org/10.1117/12.804732

KEYWORDS: Polarization, Nanoimprint lithography, Photomasks, 3D image processing, 3D modeling, Chromium, 3D displays, Lithography, Computer simulations, Device simulation

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Proceedings Article | 24 March 2008 Paper

Alignment system and process optimization for improvement of double patterning overlay

Won-kwang Ma, Jung-hyun Kang, Chang-moon Lim, HyeongSoo Kim, Seung-chan Moon, Sanjay Lalbahadoersing, Seung-chul Oh

Proceedings Volume 6922, 69222T (2008) https://doi.org/10.1117/12.772474

KEYWORDS: Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology, Etching, Lithography, Extreme ultraviolet, Data modeling, Reticles, Optical alignment

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Proceedings Article | 23 June 2000 Paper

Optimizing of thin-film interference effects in KrF lithography for 0.15-um design rules

Seung-Chul Oh, Young-Cheol Kim, Sang-Hoon Nah, Hoon Huh, Sang-Bum Han

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388379

KEYWORDS: Oxides, Thin films, Critical dimension metrology, Lithography, Reflectivity, Semiconducting wafers, Photomasks, Photoresist processing, Resolution enhancement technologies, Thin film devices

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Proceedings Article | 2 June 2000 Paper

Novel design of WIS-free overlay measurement mark

Jin-seok Yang, Sang Lee, Seung-Chul Oh, Hoon Huh, Sang-Bum Han

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386535

KEYWORDS: Platinum, Semiconducting wafers, Overlay metrology, Metals, Etching, Optical alignment, Reflection, Sputter deposition, Signal detection, Electrodes

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