Dr. Shouliang Lai Profile

Dr. Shouliang Lai

Senior Engineer at Oerlikon USA Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 7 March 2007 Paper

Plasma etching of positively sloped silicon structures

Shouliang Lai, Ken Mackenzie, Dave Johnson, Russ Westerman

Proceedings Volume 6462, 646209 (2007) https://doi.org/10.1117/12.714780

KEYWORDS: Etching, Silicon, Polymers, Plasma etching, Photomasks, Metals, Plasma, Anisotropic etching, Chemistry, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 January 2006 Paper

Endpoint detection method for time division multiplex etch processes

Russ Westerman, Dave Johnson, Shouliang Lai, Mike Teixeira

Proceedings Volume 6109, 61090I (2006) https://doi.org/10.1117/12.646498

KEYWORDS: Etching, Plasma, Silicon, Time division multiplexing, Signal processing, Semiconducting wafers, Plasma etching, Spectroscopy, Chemical analysis, Signal to noise ratio

Read Abstract +

Proceedings Article | 22 January 2005 Paper

Notch reduction in silicon on insulator (SOI) structures using a time division multiplex etch processes

Shouliang Lai, Sunil Srinivasan, Russell Westerman, Dave Johnson, John Nolan

Proceedings Volume 5715, (2005) https://doi.org/10.1117/12.582764

KEYWORDS: Etching, Silicon, Microelectromechanical systems, Time division multiplexing, Plasma, Semiconducting wafers, Multiplexing, High aspect ratio silicon micromachining, Oxides, Ions

Read Abstract +

Proceedings Article | 30 December 2003 Paper

Advanced pressure control in time division multiplexed (TDM) plasma etch processes

Shouliang Lai, Russ Westerman, Dave Johnson, John Nolan

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.521910

KEYWORDS: Etching, Time division multiplexing, Plasma etching, Silicon, Plasma, Control systems, Process control, Manufacturing, Microelectromechanical systems, Multiplexing

Read Abstract +

Proceedings Article | 15 January 2003 Paper

Scalloping minimization in deep Si etching on Unaxis DSE tools

Shouliang Lai, Dave Johnson, Russ Westerman, John Nolan, David Purser, Mike Devre

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.472750

KEYWORDS: Etching, Silicon, Switching, Time division multiplexing, Microelectromechanical systems, Plasma, Microsoft Foundation Class Library, Manufacturing, Plasma etching, Polymers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years