Mr. Shuji Nakao Profile

Shuji Nakao

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Author

Publications (25)

Proceedings Article | 16 March 2009 Paper

A proposed image intensity expressing local irradiance

Shuji Nakao, Itaru Kanai, Shinroku Maejima, Mitsuru Okuno, Naohisa Tamada, Junjiro Sakai, Akira Imai, Tetsuro Hanawa, Kazuyuki Suko

Proceedings Volume 7274, 72742Z (2009) https://doi.org/10.1117/12.812203

KEYWORDS: Polarization, Photomasks, Electromagnetism, Image filtering, Diffraction, Optical lithography, Magnetism, Lithography, Apodization, Radiometric corrections

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Proceedings Article | 19 May 2008 Paper

Application of super-diffraction-lithography (SDL) for advanced logic

Shuji Nakao, Shinroku Maejima, Yuko Mitarai, Takuya Hagiwara, Sachiko Ogawa, Tetsuro Hanawa, Kazuyuki Suko

Proceedings Volume 7028, 70283G (2008) https://doi.org/10.1117/12.793123

KEYWORDS: Photomasks, Critical dimension metrology, Photography, Resolution enhancement technologies, Printing, Immersion lithography, Logic, Transmittance, Scanning electron microscopy, Image processing

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Proceedings Article | 12 March 2008 Paper

Quasi-iso-focal hole pattern formation by Checker-Board PSM (CB-PSM)

S. Nakao, S. Maejima, A. Minamide, H. Saitoh, T. Hanawa, K. Suko

Proceedings Volume 6924, 692432 (2008) https://doi.org/10.1117/12.771615

KEYWORDS: Optical proximity correction, Photomasks, Opacity, Scanning electron microscopy, Photography, Optical lithography, Image transmission, Imaging systems, Image acquisition, Chromium

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Proceedings Article | 26 March 2007 Paper

OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs

Shuji Nakao, Shinroku Maejima, Takeshi Yamamoto, Yoshiharu Ono, Junjiro Sakai, Atsumi Yamaguchi, Akira Imai, Tetsuro Hanawa, Kazuyuki Sukoh

Proceedings Volume 6520, 65203W (2007) https://doi.org/10.1117/12.711055

KEYWORDS: Optical lithography, Scanning electron microscopy, Photography, Double patterning technology, Photomasks, Photoresist processing, Resolution enhancement technologies, Argon, Ion implantation, Current controlled current source

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Proceedings Article | 20 October 2006 Paper

A novel Alt-PSM structure: isn't this an embedded Atten-PSM?

S. Nakao, K. Hosono, S. Maejima, K. Narimatsu, T. Hanawa, K. Suko

Proceedings Volume 6349, 63492Q (2006) https://doi.org/10.1117/12.692820

KEYWORDS: Photomasks, Critical dimension metrology, Phase shifts, Image transmission, Chromium, Quartz, Printing, Logic devices, Scanning electron microscopy, Image quality

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Proceedings Article | 20 May 2006 Paper

Approximate method of mask flatness factor in focus deviation

Shinroku Maejima, Seiichiro Shirai, Akira Imai, Shuji Nakao, Koji Tange, Akira Chiba, Kunihiro Hosono, Koichiro Narimatsu

Proceedings Volume 6283, 62833A (2006) https://doi.org/10.1117/12.681829

KEYWORDS: Photomasks, Interferometers, Scanners, Semiconducting wafers, Monochromatic aberrations, Integrated circuits, Manufacturing, Critical dimension metrology, Overlay metrology, Inspection

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Proceedings Article | 21 March 2006 Paper

Verification of optical proximity effect in immersion lithography

Toshifumi Suganaga, Shinroku Maejima, Tetsuro Hanawa, Takeo Ishibashi, Shuji Nakao, Seiichiro Shirai, Koichiro Narimatsu, Kazuyuki Suko, Kenichi Shiraishi, Yuki Ishii, Tomoyuki Ando, Katsumi Ohmori

Proceedings Volume 6154, 61544K (2006) https://doi.org/10.1117/12.655526

KEYWORDS: Immersion lithography, Technetium, Lithography, Resonance energy transfer, Polymers, Manufacturing, Scanners, Scanning electron microscopy, Optics manufacturing, Optical coatings

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Proceedings Article | 15 March 2006 Paper

Application of super-diffraction lithography (SDL) for an actual device fabrication

Shuji Nakao, Shinroku Maejima, Itaru Kanai, Akihiro Nakae, Junjiro Sakai, Koichiro Narimatsu, Kazuyuki Suko

Proceedings Volume 6154, 61542A (2006) https://doi.org/10.1117/12.656043

KEYWORDS: Photomasks, Critical dimension metrology, Printing, Photography, Lithography, Scanning electron microscopy, Optical proximity correction, Logic devices, Resolution enhancement technologies, Binary data

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Proceedings Article | 12 May 2005 Paper

Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask

S. Nakao, J. Abe, A. Nakae, A. Imai, K. Narimatsu, K. Suko

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600314

KEYWORDS: Critical dimension metrology, Photomasks, Binary data, Image transmission, Resolution enhancement technologies, Lithography, SRAF, Double patterning technology, Diffraction, Optical proximity correction

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Proceedings Article | 28 May 2004 Paper

Approximation of in-resist image by aerial image with 1/n-times shorter wavelength

Shuji Nakao, Jun Abe, Takashi Okagawa, Akira Imai, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533368

KEYWORDS: Polarization control, Polarization, Critical dimension metrology, Photomasks, Reflection, Refractive index, Lithography, Light wave propagation, Image resolution, Semiconducting wafers

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Proceedings Article | 26 June 2003 Paper

Simple and highly sensitive focus monitoring utilizing an aperture on backside of photomask

Shuji Nakao, Junjirou Sakai, Shinroku Maejima, Atsushi Ueno, Akihiro Nakae, Shigenori Yamashita, Ken-ichi Itano, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485324

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Modulation, Overlay metrology, Monochromatic aberrations, Geometrical optics, Double patterning technology, Quartz, Wafer-level optics

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Proceedings Article | 26 June 2003 Paper

Zero MEF hole formation with Atten-PSM and modified illumination

Shuji Nakao, Tadashi Miyagi, Shinji Tarutani, Shigenori Yamashita, Junji Miyazaki, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485323

KEYWORDS: Critical dimension metrology, Image resolution, Photomasks, Photography, Optical proximity correction, Tolerancing, Scanning electron microscopy, Lithographic illumination, Spatial resolution, Semiconducting wafers

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Proceedings Article | 30 July 2002 Paper

Simple estimation of lens aberration with pinhole aperture on the backside of photomask

Shuji Nakao, Shinroku Maejima, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474580

KEYWORDS: Photomasks, Diffraction, Binary data, Modulation, Optical simulations, Semiconducting wafers, Diffraction gratings, Monochromatic aberrations, Projection systems, Overlay metrology

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Proceedings Article | 30 July 2002 Paper

Simple focus monitoring by eccentric illumination aperture

Shuji Nakao, Shinroku Maejima, Naohisa Tamada, Shigenori Yamashita, Atsushi Ueno, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474625

KEYWORDS: Semiconducting wafers, Photomasks, Overlay metrology, Imaging systems, Projection systems, Double patterning technology, Wafer-level optics, Printing, Diffraction, Calibration

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Proceedings Article | 30 July 2002 Paper

Implementation of phase-shift focus monitor with modified illumination

Shuji Nakao, Shinroku Maejima, Atsushi Ueno, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474643

KEYWORDS: Chromium, Semiconducting wafers, Phase shifts, Printing, Photomasks, Diffraction, Monochromatic aberrations, Wafer-level optics, Silicon, Sodium

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Proceedings Article | 30 July 2002 Paper

Iso-focal characteristics of line patterns in dark field imaging

Shuji Nakao, Shinji Tarutani, Ayumi Minamide, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474548

KEYWORDS: Critical dimension metrology, Spherical lenses, Logic devices, Photomasks, Optical proximity correction, Printing, Phase shifts, Image transmission, Monochromatic aberrations, Resolution enhancement technologies

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Proceedings Article | 14 September 2001 Paper

Innovative imaging of ultrafine line without using any strong RET

Shuji Nakao, Kouichirou Narimatsu, Tadasi Miyagi, Sachiko Ogawa, Naohisa Tamada, Akihiro Nakae, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435750

KEYWORDS: Photomasks, Critical dimension metrology, Photography, Scanning electron microscopy, Image resolution, Monochromatic aberrations, Resolution enhancement technologies, Printing, Lithography, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Random pattern formation by attenuated non-phase-shift assist pattern mask

Shuji Nakao, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435777

KEYWORDS: Critical dimension metrology, Resolution enhancement technologies, Phase shifts, Mask making, Printing, Chromium, Oxygen, Image transmission, Defect inspection, Glasses

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Proceedings Article | 5 July 2000 Paper

0.32-um pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelength

Shuji Nakao, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388949

KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Double patterning technology, Phase shifts, Lithographic illumination, Resolution enhancement technologies, Mask making, Lithography, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Extension of KrF lithography to sub-50-nm pattern formation

Shuji Nakao, Jiroh Itoh, Akihiro Nakae, Itaru Kanai, Takayiki Saitoh, Hirosi Matsubara, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389025

KEYWORDS: Chromium, Photomasks, Scanning electron microscopy, Photography, Lithography, Critical dimension metrology, Photoresist processing, Plasma, Semiconducting wafers, Image processing

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Proceedings Article | 5 July 2000 Paper

Basic imaging characteristics of phase-edge lithography and impact of lens aberration on these characteristics

Shuji Nakao, Itaru Kanai, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388967

KEYWORDS: Monochromatic aberrations, Chromium, Critical dimension metrology, Lithographic illumination, Lithography, Photomasks, Fermium, Distortion, Spherical lenses, Tolerancing

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Proceedings Article | 29 June 1998 Paper

Influence of aberration on performance during use of resolution enhancement technology

Kouichirou Tsujita, Junjiro Sakai, Akihiro Nakae, Shuji Nakao, Wataru Wakamiya

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310820

KEYWORDS: Monochromatic aberrations, Printing, Optical proximity correction, Resolution enhancement technologies, Phase shifts, Imaging systems, Photomasks, Projection systems, Lithographic illumination, Lithography

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Proceedings Article | 28 July 1997 Paper

Proposal for pattern layout rule in application of alternating phase-shift mask

Akihiro Nakae, Shuji Nakao, Yasuji Matsui

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277281

KEYWORDS: Diffraction, Photomasks, Monochromatic aberrations, Modulation, Phase shifts, Image analysis, Critical dimension metrology, Projection systems, Lithography, Excimer lasers

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Proceedings Article | 7 July 1997 Paper

Reduction of mask-error effect utilizing pupil filter in alternative phase-shift lithography

Shuji Nakao, Akihiro Nakae, Kouichirou Tsujita, Yasuji Matsui

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276004

KEYWORDS: Photomasks, Error analysis, Lithography, Image filtering, Phase shifts, Diffraction, Lithographic illumination, Tolerancing

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Proceedings Article | 7 June 1996 Paper

Fast and accurate optical proximity correction based on aerial image simulation

Tetsuro Hanawa, Kazuya Kamon, Akihiro Nakae, Shuji Nakao, Koichi Moriizumi

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240929

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Critical dimension metrology, Binary data, Diffraction, Optical lithography, Lithographic illumination, Imaging systems, Scanning electron microscopy

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Showing 5 of 25 publications

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