CONFERENCE PROCEEDINGS
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Susumu Isago
at Nikon Corp
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Author
Publications (3)
Proceedings Article | 15 March 2016 Paper
High-order aberration control during exposure for leading-edge lithography projection optics
Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, Hidetaka Kawahara
Proceedings Volume 9780, 97800Y (2016) https://doi.org/10.1117/12.2218840
KEYWORDS: Wavefronts, Control systems, Deformable mirrors, Distortion, Optical lithography, Lithography, Projection systems, Overlay metrology, Performance modeling, Mirrors
Proceedings Article | 12 April 2013 Paper
Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay
Yohei Fujishima, Satoshi Ishiyama, Susumu Isago, Akihiro Fukui, Hajime Yamamoto, Toru Hirayama, Tomoyuki Matsuyama, Yasuhiro Ohmura
Proceedings Volume 8683, 86831I (2013) https://doi.org/10.1117/12.2010908
KEYWORDS: Distortion, Reticles, Lithography, Switching, Water, Semiconducting wafers, Imaging systems, Deformable mirrors, Lithographic lenses, Immersion lithography
Proceedings Article | 23 March 2011 Paper
An aberration control of projection optics for multi-patterning lithography
Yasuhiro Ohmura, Taro Ogata, Toru Hirayama, Hisashi Nishinaga, Takeshi Shiota, Satoshi Ishiyama, Susumu Isago, Hidetaka Kawahara, Tomoyuki Matsuyama
Proceedings Volume 7973, 79730W (2011) https://doi.org/10.1117/12.879616
KEYWORDS: Wavefronts, Switching, Semiconducting wafers, Deformable mirrors, Polarization, Image processing, Glasses, Standards development, Critical dimension metrology, Monochromatic aberrations
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