Dr. Tae Dong Kang Profile

Dr. Tae Dong Kang

Project Manager at Nova Measuring Instruments Korea Ltd.

SPIE Involvement:

Author

Area of Expertise:

Ellipsometry , OCD , film thickness , Optical metrology

Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Modeling of polarization state change induced by off-axis reflective objectives for beam focusing in spectroscopic ellipsometry

Tae Dong Kang, Daewon Kwon, Inhee Joh, Myeongrok Oh, Mita Park, Hwanseong Moon, Seonmi Shin, Jooil Jang, Jinwon Park, Sangjun Park, Junje Seong, Ghilsoo Lee, Sungtae Kim

Proceedings Volume 12955, 129553W (2024) https://doi.org/10.1117/12.3025291

KEYWORDS: Reflection, Objectives, Polarization, Semiconducting wafers, Optical systems, Calibration, Film thickness, Modeling, Ellipsometry

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Proceedings Article | 10 April 2024 Poster + Paper

Analysis software development for optical critical dimension based on RCWA and 3D modeling

Jiwon Lee, Minhyeok Lee, Shinyoung Ryu, Kwangwoo Kim, Jongjeong Kim, Tae Dong Kang

Proceedings Volume 12955, 129553U (2024) https://doi.org/10.1117/12.3022262

KEYWORDS: 3D modeling, 3D applications, Semiconductors, Deep learning, Metrology, Algorithm development, Mathematical optimization, Evolutionary algorithms, 3D metrology, Software development

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Proceedings Article | 27 April 2023 Poster + Paper

Fourier analysis of spectrum for precision improvement in thickness determined by machine learning

Moon Il Shin, Inhee Joh, Sayyeon Joung, Jiwon Lee, Minhyeok Lee, Kyusik Kim, Shinyoung Ryu, Tae Dong Kang

Proceedings Volume 12496, 124962I (2023) https://doi.org/10.1117/12.2657792

KEYWORDS: Reflectivity, Oxides, Data modeling, Fourier transforms, Film thickness, Machine learning, Education and training, Performance modeling, Spectral response, Mathematical optimization

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Proceedings Article | 19 February 2009 Paper

GaN-based vertical cavities on highly reflective and crack-free nitride distributed Bragg reflectors

X. Ni, R. Shimada, T. Kang, J. Leach, Ü. Özgür, H. Morkoç

Proceedings Volume 7216, 72162F (2009) https://doi.org/10.1117/12.807902

KEYWORDS: Reflectivity, Gallium nitride, Semiconducting wafers, Distributed Bragg reflectors, Vertical cavity surface emitting lasers, Aluminum nitride, Silica, Scanning electron microscopy, Aluminum, Photomasks

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