We report the status of CO2-Sn-LPP (Laser-produced-plasma) EUV light source that is being developed at Gigaphoton. Our unique and original technologies are; the combination of a pulsed CO2 laser with Sn droplets, dual wavelength laser application and Sn mitigation with a magnetic field. With these technologies, we achieved >250W (clean burst power at I/F) during more than 10 Billion pulses of operation.
At the conference, we will present the development progress of system key components of our EUV light source and the evaluation results of the rate of decrease in reflectivity of actual collector mirrors at >250W.
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