Dr. Uwe Dersch Profile

Dr. Uwe Dersch

Senior R&D Engineer EUV Masks at Advanced Mask Technology Ctr

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Author

Publications (15)

Proceedings Article | 19 May 2008 Paper

Metrology of EUV masks by EUV-scatterometry and finite element analysis

Jan Pomplun, Sven Burger, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 7028, 70280P (2008) https://doi.org/10.1117/12.793032

KEYWORDS: Extreme ultraviolet, Diffraction, Finite element methods, Photomasks, Scanning electron microscopy, Critical dimension metrology, Chemical elements, Cadmium, Scatterometry, Maxwell's equations

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Proceedings Article | 21 March 2008 Paper

Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation

Frank Scholze, Christian Laubis, Gerhard Ulm, Uwe Dersch, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 6921, 69213R (2008) https://doi.org/10.1117/12.771923

KEYWORDS: Extreme ultraviolet, Scatterometry, Critical dimension metrology, Photomasks, Diffraction, Finite element methods, Multilayers, Extreme ultraviolet lithography, Reflectivity, Reflectometry

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Proceedings Article | 18 June 2007 Paper

Influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks

Frank Scholze, Christian Laubis, Uwe Dersch, Jan Pomplun, Sven Burger, Frank Schmidt

Proceedings Volume 6617, 66171A (2007) https://doi.org/10.1117/12.726159

KEYWORDS: Extreme ultraviolet, Diffraction, Scatterometry, Critical dimension metrology, Photomasks, Scattering, Light scattering, Finite element methods, Reflectometry, Reflectivity

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Proceedings Article | 18 June 2007 Paper

Finite element analysis of EUV lithography

Jan Pomplun, Sven Burger, Frank Schmidt, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 6617, 661718 (2007) https://doi.org/10.1117/12.726156

KEYWORDS: Diffraction, Extreme ultraviolet, Finite element methods, Photomasks, Scatterometry, Scatter measurement, Computer simulations, Extreme ultraviolet lithography, Scanning electron microscopy, Scattering

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Proceedings Article | 5 April 2007 Paper

Advanced edge roughness measurement application for mask metrology

Thomas Marschner, Jan Richter, Uwe Dersch, Amit Moran, Ruthy Katz, David Chase, Reuven Falah, Thomas Coleman

Proceedings Volume 6518, 65181R (2007) https://doi.org/10.1117/12.712530

KEYWORDS: Photomasks, Line edge roughness, Computer aided design, Metrology, Signal processing, Critical dimension metrology, Line width roughness, Semiconducting wafers, Edge roughness, Scanning electron microscopy

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Proceedings Article | 20 October 2006 Paper

Rigorous FEM simulation of EUV masks: influence of shape and material parameters

Jan Pomplun, Sven Burger, Frank Schmidt, Lin Zschiedrich, Frank Scholze, Christian Laubis, Uwe Dersch

Proceedings Volume 6349, 63493D (2006) https://doi.org/10.1117/12.686828

KEYWORDS: Extreme ultraviolet, Finite element methods, Diffraction, Scatterometry, Photomasks, Scatter measurement, Computer simulations, Numerical simulations, Critical dimension metrology, Scattering

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Proceedings Article | 20 October 2006 Paper

Manufacturing of the first EUV full-field scanner mask

Uwe Dersch, Rico Buettner, Christian Chovino, Steffen Franz, Torben Heins, Holger Herguth, Jan Hendrik Peters, Thomas Rode, Florian Letzkus, Joerg Butschke, Mathias Irmscher

Proceedings Volume 6349, 63492G (2006) https://doi.org/10.1117/12.686035

KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Reflectivity, Manufacturing, Extreme ultraviolet lithography, Scanners, Optical lithography, Photoresist processing, Chromium

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Proceedings Article | 21 June 2006 Paper

The first full-field EUV masks ready for printing

Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, Holger Seitz

Proceedings Volume 6281, 628105 (2006) https://doi.org/10.1117/12.692629

KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Etching, Tolerancing, Image processing, Coating, Printing, Lithography, Reflectivity

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Proceedings Article | 24 March 2006 Paper

Line edge roughness on photo lithographic masks

Torben Heins, Uwe Dersch, Roman Liebe, Jan Richter

Proceedings Volume 6152, 61521O (2006) https://doi.org/10.1117/12.655531

KEYWORDS: Line edge roughness, Photomasks, Semiconducting wafers, Lithography, Scanning electron microscopy, Electron microscopes, Standards development, Semiconductors, Critical dimension metrology, Electron beams

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Proceedings Article | 8 November 2005 Paper

EUVL mask manufacturing: technologies and results

Florian Letzkus, Joerg Butschke, Mathias Irmscher, Holger Sailer, Uwe Dersch, Christian Holfeld

Proceedings Volume 5992, 59922A (2005) https://doi.org/10.1117/12.628957

KEYWORDS: Etching, Extreme ultraviolet lithography, Wet etching, Photomasks, Dry etching, Chromium, Electron beam lithography, Scanning electron microscopy, Silicon, Manufacturing

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Proceedings Article | 28 June 2005 Paper

EUV mask image placement management in writing, registration, and exposure tools

Eric Cotte, Uwe Dersch, Christian Holfeld, Uwe Mickan, Holger Seitz, Thomas Leutbecher, Gunter Hess

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617484

KEYWORDS: Photomasks, Reticles, Optical lithography, Extreme ultraviolet, Photovoltaics, Extreme ultraviolet lithography, Image registration, Tolerancing, Electron beam lithography, Image quality

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Proceedings Article | 10 May 2005 Paper

Impact of EUV mask pattern profile shape on CD measured by CD-SEM

Uwe Dersch, Arnd Korn, Cornelia Engelmann, Carl Frase, Wolfgang Haessler-Grohne, Harald Bosse, Florian Letzkus, Joerg Butschke

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598644

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Monte Carlo methods, Extreme ultraviolet, Photomasks, Detection and tracking algorithms, Silicon, Electron beams, Extreme ultraviolet lithography, Signal detection

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Siegfried Schwarzl, Frank-Michael Kamm, Stefan Hirscher, Klaus Lowack, Wolf-Dieter Domke, Markus Bender, Stefan Wurm, Adam Pawloski, Bruno La Fontaine, Christian Holfeld, Uwe Dersch, Florian Letzkus, Joerg Butschke

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 6 December 2004 Paper

Numerical and experimental study of oxide growth on EUV mask capping layers

Eric Cotte, Christian Holfeld, Uwe Dersch, Guenther Ruhl, Jan Perlich

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569276

KEYWORDS: Reflectivity, Silicon, Oxides, Data modeling, Extreme ultraviolet, Interfaces, Performance modeling, Inspection, Silica, Photomasks

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Adam Pawloski, Bruno La Fontaine, Harry Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, Patrick Naulleau, Florian Letzkus, Joerg Butschke

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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Showing 5 of 15 publications

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