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Walt Johnson
Sr. Mbr. Technical Staff at KLA Corp
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Author
Publications (3)
Proceedings Article | 13 September 1996 Paper
Noncontact sheet resistance measurements for doped polysilicon process control
Walter Johnson, Le Nguyen, Robert Schanzer, Tim Campbell, Jim White
Proceedings Volume 2876, (1996) https://doi.org/10.1117/12.250900
KEYWORDS: Resistance, Semiconducting wafers, Oxides, Etching, Calibration, Process control, Doping, Silicon, Chlorine, Inductance
Proceedings Article | 19 September 1995 Paper
Elimination of monitor wafers in metal film process control
Walter Johnson, Dan Hobbs, Ron Jones, Gary Pors
Proceedings Volume 2637, (1995) https://doi.org/10.1117/12.221325
KEYWORDS: Semiconducting wafers, Metals, Resistance, Process control, Tungsten, Particles, Inductance, Chlorine, Deposition processes, Chemical vapor deposition
Proceedings Article | 1 April 1991 Paper
RTP temperature uniformity mapping
W. Keenan, Walter Johnson, David Hodul, David Mordo
Proceedings Volume 1393, (1991) https://doi.org/10.1117/12.25718
KEYWORDS: Semiconducting wafers, Oxides, Resistance, Calibration, Temperature metrology, Ions, Fourier transforms, Silver, Software development, Annealing
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