Dr. Wan-Soo Kim Profile

Dr. Wan-Soo Kim

at Qoniac GmbH

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Author

Publications (7)

Proceedings Article | 22 February 2021 Presentation + Paper

Optimizing focus and dose process windows for robust process control using a multi-feature analysis

Philip Groeger, Ranjan Khurana, Aayush Mitra, Mycahya Eggleston, Stefan Buhl, Wan-Soo Kim, Xaver Thrun

Proceedings Volume 11611, 116111E (2021) https://doi.org/10.1117/12.2583928

KEYWORDS: Process control, Finite element methods, Semiconducting wafers, Optical lithography, Semiconductors, Scanners, Logic, High volume manufacturing, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2020 Paper

Advanced high order field-to-field modeling for wafer edge control

Boris Habets, Stefan Buhl, Wan-Soo Kim, Patrick Lomtscher, Holger Bald, Tobias Hoeer

Proceedings Volume 11327, 113270U (2020) https://doi.org/10.1117/12.2552714

KEYWORDS: Semiconducting wafers, Data modeling, Performance modeling, Overlay metrology, Computer simulations, Data corrections, Metrology, Statistical modeling, Neodymium, Statistical analysis

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Proceedings Article | 26 March 2019 Paper

CD and OCD sampling scheme optimization for HVM environment

Chanha Park, Hongoo Lee, Dongyoung Lee, Ahlin Choi, Stefan Buhl, Wan-Soo Kim, Philip Groeger, Steffen Guhlemann, Seop Kim, Mingyu Kim

Proceedings Volume 10959, 109592F (2019) https://doi.org/10.1117/12.2514975

KEYWORDS: Metrology, Data modeling, Statistical modeling, Critical dimension metrology, Data corrections

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Proceedings Article | 13 March 2018 Paper

In-depth analysis and characterization of a dual damascene process with respect to different CD

Gerd Krause, Detlef Hofmann, Boris Habets, Stefan Buhl, Manuela Gutsch, Alberto Lopez-Gomez, Wan-Soo Kim, Xaver Thrun

Proceedings Volume 10585, 105852T (2018) https://doi.org/10.1117/12.2302971

KEYWORDS: Critical dimension metrology, Oxides, Capacitance, Semiconducting wafers, Etching, Metals, Resistance, Copper, Photomasks, Chemical mechanical planarization

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Proceedings Article | 28 March 2017 Presentation + Paper

In-depth analysis of indirect overlay method and applying in production environment

Detlef Hofmann, Frank Rabe, Stefan Buhl, Wan-Soo Kim, Boris Habets

Proceedings Volume 10145, 101450E (2017) https://doi.org/10.1117/12.2257963

KEYWORDS: Distortion, Overlay metrology, Process control, Virtual reality, Metrology, Environmental sensing, Front end of line, Back end of line, Reliability, Statistical analysis, Semiconducting wafers, Model-based design, Metals, Data modeling, Optical alignment

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Proceedings Article | 28 March 2017 Paper

Monitoring of multi-patterning processes in production environment

Sangjun Han, Honggoo Lee, Jaesun Woo, Seungyoung Kim, Wan-Soo Kim, Stefan Buhl, Boris Habets, Seop Kim

Proceedings Volume 10145, 101452M (2017) https://doi.org/10.1117/12.2257978

KEYWORDS: Critical dimension metrology, Optical lithography, Lithography, Environmental monitoring, Semiconducting wafers, Semiconductors, Etching, Photomasks, Image processing, Metrology

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Proceedings Article | 2 May 2006 Paper

Modeling of an electromagnetically actuated spindle system considering bidirectional bearing compliance

Su Zhao, Tae-hwa Kim, Wan-soo Kim, Sun-kyu Lee

Proceedings Volume 6042, 60424F (2006) https://doi.org/10.1117/12.664811

KEYWORDS: Spindles, Systems modeling, Sensors, Mechatronics, Actuators, Control systems, Magnetism, Matrices, MATLAB, Electromagnetism

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Showing 5 of 7 publications

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