Dr. Wolfram Koestler Profile

Dr. Wolfram Koestler

at Qimonda Dresden GmbH & Co OHG

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 12 May 2005 Paper

OPC for double exposure lithography

Thorsten Winkler, Wolfgang Dettmann, Mario Hennig, Wolfram Koestler, Molela Moukara, Joerg Thiele, Karsten Zeiler

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599441

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Lithographic illumination, Optical lithography, Metals, Semiconducting wafers

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Proceedings Article | 12 May 2005 Paper

CD control: Whose turn is it?

Wolfram Koestler, Martin Rossiger, Stephan Wege, Thomas Zell

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598443

KEYWORDS: Etching, Semiconducting wafers, Critical dimension metrology, Photomasks, Lithography, Metrology, Code division multiplexing, Process control, Scanning electron microscopy, Statistical analysis

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Proceedings Article | 2 June 2003 Paper

Overlay considerations for 300-mm lithography

Tobias Mono, Uwe Schroeder, Dieter Nees, Katrin Palitzsch, Wolfram Koestler, Jens Bruch, Sirko Kramp, Markus Veldkamp, Ralf Schuster

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485019

KEYWORDS: Semiconducting wafers, Overlay metrology, Lithography, Manufacturing, Process control, Semiconductors, Optical lithography, Critical dimension metrology, Reticles, Tungsten

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Proceedings Article | 18 August 2000 Paper

Is lithography ready for 300 mm?

Alain Charles, Clint Haris, Steffen Hornig, Dietmar Ganz, Thorsten Schedel, Guenther Hraschan, Wolfram Koestler, John Maltabes, Karl Mautz, Sebastian Schmidt, Ralf Schuster

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395736

KEYWORDS: Lithography, Semiconducting wafers, Photoresist developing, Scanners, Deep ultraviolet, Semiconductors, Manufacturing, Photoresist materials, Thin film coatings

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Proceedings Article | 5 July 2000 Paper

Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners

Thorsten Schedel, Alain Charles, Dietmar Ganz, Steffen Hornig, Guenther Hraschan, Wolfram Koestler, John Maltabes, Karl Mautz, Thomas Metzdorf, Ralf Otto, Sebastian Schmidt, Ralf Schuster

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389023

KEYWORDS: Semiconducting wafers, Scanners, Deep ultraviolet, Lithography, Particles, Critical dimension metrology, Semiconductors, Manufacturing, Contamination, Data processing

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