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Xiangwei Liu
at Hefei Univ of Technology
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Publications (1)
Proceedings Article | 19 November 2021 Paper
Elimination method of overexposed areas in speckle pattern interferometry
Shuangle Wu, Yanfeng Yao, Xiangwei Liu, Huanqing Wang, Yonghong Wang, Peizheng Yan
Proceedings Volume 12059, 120590S (2021) https://doi.org/10.1117/12.2611962
KEYWORDS: Glasses, Polarizers, Speckle pattern, Shearography, Optical filters, Interferometry, Polarization, Reflection, Imaging systems, Phase measurement
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