The full-spectrum high-precision optical surface is important for advanced laser components, and the Fizeau interferometer serves as a coral tool for evaluating low-frequency surface errors of these surface. In high-precision surface calibrated method, absolute surface calibration are generally employed to calibrate the surface, thus obtaining their absolute surface errors. This paper proposed a novel absolute surface calculation method. Its spectral response capability was studied. Based on Gaussian Power Spectral Density(PSD), random errors of surface are constructed for this method. The method was studied by error analysis, including errors introduced during interpolation, Fourier transforms, rotation angles, and interpolation results with different power spectral densities was studied, which demonstrates that full-spectrum response capability of the absolute surface calibration method meets the high-precision optical surface metrology.
This work presents a novel method to simultaneously measure a quarter-wave plate's phase retardation and fast axis using radially polarized vector beams and spatial Fourier analysis. The light beam is converted into a radially polarized beam after passing through a polarizer and a vortex retarder. The tested quarter-wave plate and a polarizer are placed after the vortex retarder in sequence, and an hourglass intensity distribution image is recorded by a camera. Then the phase retardation and fast axis of a quarter-wave plate can be calculated by using Fourier analysis of the recorded intensity image with a snapshot. The theoretical model of the proposed method is built based on the Stokes-Mueller formalism. And both simulation calculation and experiments are carried out with different fast axis angles of a quarter-wave plate. The measurement errors of the phase retardation and fast axis are also analyzed to validate the proposed method. Both simulation calculation and experimental results show good agreement with the theoretical values. It is demonstrated that the proposed method is convenient, simple, and accurate to measure the phase retardation and fast axis of a quarter-wave plate.
Laser induced breakdown spectroscopy (LIBS) is a rapid and simple detection method with almost no sample preparation. In this paper, LIBS was used to detect the electrolyte elements Na and K in human blood. The liquid drop method and evaporation method were used to improve the LIBS detection capability. The polynomial fitting method and wavelet transform method were proposed to optimize the LIBS spectrum. The results showed that, the signal to background ratio (SBR) of Na Ⅰ 588.99nm spectral line increased by 20.57 times after use the methods, and the SBR of K Ⅰ 766.49nm increased 24.65 times. The intensity of Na Ⅰ 588.99nm spectral line obtained by liquid drop method is 1.05 times higher than evaporation method, and 194.08 times higher than direct detection the human blood through test tube. The intensity of K Ⅰ 766.49nm spectral line obtained by liquid drop method is 2.41 times high than evaporation method. According to the results, LIBS is suitable for the detection of electrolyte elements Na and K in human blood. The polynomial fitting method and wavelet transform method can greatly increase the SBR of Na Ⅰ 588.99nm and K Ⅰ 766.49nm in human blood. The liquid drop method can greatly improve the LIBS detection capability of electrolyte elements Na and K in human blood. Compared with the existing blood electrolyte elements detection methods, liquid drop method is more efficient and easier to operate.
Resolution is one of the key performances of the lithography tool. Decreasing the exposure wavelength and increasing the numerical aperture (NA) of the objective lens can enhance the lithography tool resolution. Therefore, the exposure wavelength is reduced to deep ultraviolet (DUV), and a polarized illumination is adopted. The polarization effect of the exposure system seriously affects the imaging quality. The polarization parameters must be measured accurately. Due to the grating polarizer's compactness and wide acceptance angle, it is introduced to the polarization measurement. It could simplify the measurement system and achieve high-accuracy real-time measurement. A bilayer metallic grating polarizer with tapered slits is designed based on the inverse polarizing effect and transmission enhancement effect of TE-polarized light. The physical mechanism of transmission enhancement on TE-polarized light and transmission suppression on TM polarized light have been analyzed. The simulation results show that the enhancement of TE-polarized light transmission and the extinction ratio is mainly modulated by the middle dielectric layer height and the metal width and height of the top layer grating. For the designed grating polarizer with tapered slits, the transmission of TE-polarized light is 59.4%, and the extinction ratio is 75dB at normal incidence. Compared with the previous bilayer metal grating polarizer, both the TE transmission and extinction ratio are enhanced simultaneously. The designed grating polarizer can meet the performance requirements of the polarization measurement device in immersion lithography tools within a large process tolerance range.
System parameters are important factors that affect the spatial characteristics of laser induced plasma spectral intensity. In this paper, a two-dimensional LIBS model is used to study the effects of laser incident angle and laser energy on the spatial characteristics of spectral intensity. The model is mainly based on fluid dynamics and SAHA equation. In the research, the best laser incidence angle, the best spectrum detection angle of the system under different parameters are obtained. The variation trend of the spectral intensity of laser plasma with the detection angle under different parameters is studied. The results show that 0° is the best incident angle for 1064 nm laser with different delay time and different delay conditions. When the incident angle is 0°, the excited plasma radiation has a stronger spectral signal at different detection angles. Corresponding to the incident angle of 0°, the optimal detection angles are ±41°, ±11° and ±12° at 100 ns, 500 ns and 1000 ns delay conditions, respectively. The simulation results also show that the signal intensity of the plasma radiation spectrum increases and then decreases at the optimal detection angle with the decrease of the absolute value of the detection angle. The experiments have verified the simulation results.
Epidermal layer recognition is an effective way to diagnose the severity of psoriasis and other skin diseases. Optical coherence tomography (OCT) is a non-invasive imaging modality that acquires images of tissue in vivo and plays an important role in detecting skin diseases and assessing therapeutic effects. In this paper, a method for epidermal layer recognition of OCT skin images is proposed. Firstly, the skin surface is obtained based on the axial gradient map. Then the original image is flattened according to the estimated skin surface. And the potential region of the dermo-epidermal junction (DEJ) is obtained according to the mean column signal. Finally, the epidermal layer is identified by topology transmission and seed filling. The method can automatically segment the curved mastoid structure of the DEJ which is suitable for OCT images of skin with weakened signal intensity of dermis due to dermatitis or other diseases.
Laser-induced breakdown spectroscopy (LIBS)is a real-time and rapid analysis method, which can realize quantitative analysis of element concentration in solid, liquid or gaseous samples. In this paper, a micro-LIBS system was designed for the quantitative analysis of heavy metals concentration in polluted water. The composition of the elements in the polluted water is abundant. Therefore, the characteristic spectral lines of heavy metal elements in polluted water are easy to be overlapped with adjacent characteristic spectral lines due to the spectral line broadening. This paper introduces the Fourier self-deconvolution (FSD) method to solve the problem of characteristic spectral overlap in LIBS quantitative analysis of heavy metals in polluted water. Fourier self-deconvolution (FSD) can decrease the spectral linewidth by taking deconvolution on the spectral using the shape information of the spectral itself. By combining the FSD with other methods such as baseline removal, wavelet domain denoising, spectral normalization and outlier discarding, the LIBS detection limit of Pb concentration in polluted water can reach 79.66 ppm.
In optical lithography, aberrations induced by lens heating effects of a projection lens lead to degradation of imaging quality. In order to compensate for thermal aberrations, it is crucial to apply an accurate method for thermal aberration prediction. An effective and accurate method for thermal aberration prediction is proposed. A double exponential model is modified in respect of the timing of exposure tools, and a particle filter is used to adjust the double exponential model. Parameters of the model are updated recursively pursuant to the aberration data measured during the exchange of wafers. The updated model is used to predict thermal aberrations during the following exposure of wafers. The performance of the algorithm is evaluated by the simulation of a projection lens for argon fluoride lithography. Simulation results show that predictive errors of primary defocus and astigmatism are significantly reduced, and the mean value of wavefront error in the whole field of view is reduced by about 30% in a vertical line/space pattern. The proposed method is easily adaptable to different types of aberration measurement error.
In optical lithography tools, thermal aberration of a projection lens, which is caused by lens heating effect, leads to degradation of imaging quality. In addition to in-line feedforward compensation technology, thermal aberration can be reduced by optimizing optical design of a projector. Thermal aberration analysis of a projection lens benefits the optimization of optical design. A model of lens heating effect for a lithographic projector is introduced, which is capable of evaluating the synthetical thermal aberration of a projector as well as analyzing the contribution of an individual optical element. Simulation results by the introduced model show that not only the deformation of lens surface, the variance of refractive index but also the change of optical path, which depends on optical design, should be considered in thermal aberration analysis. The contributions of optical elements at different locations of the projector are also analyzed. Based on the model and the simulation results, an optimization method is proposed. A projector for i-line lithography is optimized by the proposed method. Main aberrations Z5, Z9, and Z17 are reduced by about 40%. The image quality of the lithographic projector in steady state is also improved.
In optical lithography, lens heating induced aberrations of a projection lens lead to degradation of imaging quality. In order to accurately compensate for thermal aberrations by integrated manipulators in projection lens, it is crucial to apply an accurate method for thermal aberration prediction. In this paper, an effective and accurate method for thermal aberration prediction is proposed. Double exponential model is simplified in respect of the timing of exposure tools, and particle filter is used to adjust the parameters of the double exponential model. Parameters of the simplified model are updated recursively pursuant to the aberration data measured during the exchange of wafers. The updated model is used to predict thermal aberrations of the lens during the following exposure of wafer. The performance of the algorithm is evaluated by simulation of a projection lens for ArF lithography. Maximum root mean square (RMS) value of perdition error of thermal aberration under annular illumination and dipolar illumination are reduced by 68.3% and 76.1%, respectively. The proposed method is also of well adaptability to different types of aberration measurement error.
In optical lithography tools, thermal aberration of a projection lens, which is caused by lens heating, leads to degradation of imaging quality. In addition to in-line feedforward compensation technology [1], the thermal aberration can be reduced by optimizing projection lens design. Thermal aberration analysis of a projection lens benefits the optimization of projection lens design. In this paper, thermal aberration analysis methods using physical model and simplified model are compared. Physical model of lens heating provides accurate thermal aberration analysis, but it is unable to analyze the contribution of an element of the lens to thermal aberration which is significant for thermal optimization[2]. Simplified model supports thermal analysis of an element of a lens[3]. However, only the deformation of lens surface and the variance of refractive index are considered in the simplified model. The thermal aberration analysis, in this paper, shows not only the deformation of lens surface, the variance of refractive index but also the change of optical path should be considered in thermal aberration analysis. On the basis of the analysis, a strategy for optimizing projection lens design is proposed and used to optimize thermal behavior of a lithography projection lens. The RMS value of thermal aberration is reduced by 31.8% in steady state.
This paper proposes an analytical model to describe the mask diffraction in EUV lithography. The model is used to
improve the understanding of the EUV mask performance and to analyze relevant mask topography effects. The
multilayer and absorber constituting the EUV mask are simulated separately in this model. The light incident on the
mask is first diffracted by the absorber, and then reflected by the multilayer and propagated upwards through the
absorber again. The multilayer reflection is calculated by a mirror approximation, and the absorber transmission is
calculated by a modified Kirchhoff model, where the absorber is considered to be thin and located in a certain plane.
Moreover, an analytical expression of the diffraction spectrum of masks with arbitrary pattern orientation is derived.
Comparisons with rigorous simulation are used to validate the accuracy of the developed model. It predicts mask
diffraction of 16nm wide line and space features. For 0.35 NA EUV systems with an incidence angle of 6° the simulated
CD errors are below 0.5 nm, with a pattern pitch ranging from 32nm to 250nm.
Two optical sectioning imaging technologies with visible laser and near infrared laser illumination to apply industrial and biologic detection are presented respectively in this paper. One of them is based on fiber optical confocal scanning microscopy, the other is imaging-relay arrangement with small visible field. The systems have resolution of submicron at lateral direction and nanometer resolution in axial direction and wider work range about submillimeter magnitude.
In confocal scanning imaging system, using apodization masks can improve the system resolution. A mask based on circle grating function with different spacing is presented and made, which is simple and easy to practically make and apply. The experiments of using a mask are performed in a reflection-mode fiber confocal scanning microscope. The intensity response curves in transverse and axial direction of this system are given. A sharp straight edge of a flat object is measured. And the 2D image of a biological organism is also given. The results demonstrate that adding this apodization mask does not reduce the axial resolution while improve the transverse resolution.
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