Dr. Yefim G. Belenky Profile

Dr. Yefim G. Belenky

Sr. Member of Consulting Staff at D2S Inc

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 21 March 2007 Paper

Multidimensional physical design optimization for systematic and parametric yield loss reduction

L. Karklin, A. Arkhipov, Y. Belenky, C. Decoin, D. Lay, V. Manuylov, C. Zelnik, B. Watson, J. Willekens

Proceedings Volume 6521, 65210Q (2007) https://doi.org/10.1117/12.711774

KEYWORDS: Silicon, Optical proximity correction, Design for manufacturing, Lithography, Manufacturing, Design for manufacturability, Process modeling, Photomasks, Computer simulations, Device simulation

Read Abstract +

This presentation demonstrates one of Design-for-Manufacturing (DFM) solutions where a combination of design rules and lithography analysis (NILS, MEEF, and PW) is used as a basis for physical design correction and optimization. A physical design flow typically includes RET/OPC and post-OPC verification (Silicon DRC) steps. Error markers, generated at the verification step, show locations of so-called "hot spots" which are lithographically sensitive, areas prone to silicon failures. In our approach "hot spots" are traced back to a design and the design has been optimized to make those areas manufacturable. "Hot spot" markers of a flat post OPC layout are analyzed and categorized and only a unique instance of a "hot spot" is traced back to design hierarchy and corrected. Layout correction and optimization is guided by litho analysis and design intent. A set of lithography specific local constraints is added to a set of global constraints (DRC rules). A constraint-solving engine generates a new version of the layout that is DRC correct and is now "lithography/OPC friendly". Depending on a user accessible set of parameters, design correction could be done with or without polygons edge segmentation and without critical area increase. Different lithography technologies (such as immersion lithography with hyper NA) and different process models could be applied. Device electrical performance in conjunction with simulated and extracted silicon shapes is discussed. Layout correction is done on a minimum edge/polygon movement principle, which leads to DRC clean and LVS respectful solution.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years