Dr. Yue Ma Profile

Dr. Yue Ma

at ASML San Diego

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper

High-power EUV light sources (>500w) for high throughput in next-generation EUV lithography tools

Klaus Hummler, Qiushi Zhu, Keegan Behm, Liane Matthes, Zhaohan He, Omar Biabani, Andrew LaForge, Bob Rollinger, Dustin Urone, Niek Kleemans, Martin Jurna, Sean McGrogan, Peter Mayer, Michael Purvis, Sander Derks, Alberto Villalta, Abhiram Govindaraju, Yue Ma, Daniel Brown

Proceedings Volume 12953, 129530V (2024) https://doi.org/10.1117/12.3010463

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Carbon monoxide, Light sources, Tin, Semiconducting wafers, Scattering, Scanners, Gas lasers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years