Prof. Konstantin V. Rudenko Profile

Prof. Konstantin V. Rudenko

at Valiev Institute of Physics and Technology RAS

SPIE Involvement:

Author | Editor

Publications (32)

Proceedings Article | 31 January 2022 Paper

Paper

Investigation of plasma resistance of the HSQ electronic resist for prototyping of nanoelectronic devices

A. Miakonkikh, A. Shishlyannikov, A. Tatarintsev, V. Kuzmenko, K. Rudenko, E. Gornev

Proceedings Volume 12157, 1215717 (2022) https://doi.org/10.1117/12.2626386

KEYWORDS: Etching, Silicon, Plasma, Plasma etching

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Proceedings Article | 31 January 2022 Paper

Paper

Cobalt subtractive etch for advanced interconnects

A. Rogozhin, A. Miakonkikh, A. Tatarintsev, I. Amirov, K. Rudenko

Proceedings Volume 12157, 1215718 (2022) https://doi.org/10.1117/12.2624333

KEYWORDS: Etching, Cobalt, Plasma, Plasma etching, Polymethylmethacrylate, Copper, Reactive ion etching, Scanning electron microscopy, Metals

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Proceedings Article | 31 January 2022 Paper

Paper

Methylated porous low-k materials: critical properties and plasma resistance

A. Rezvanov, A. Miakonkikh, A. Vishnevskiy, D. Seregin, K. Vorotilov, K. Rudenko, M. Baklanov

Proceedings Volume 12157, 1215716 (2022) https://doi.org/10.1117/12.2624608

KEYWORDS: Plasma, Etching, Dielectrics, Carbon, Resistance, Refractive index, Fluorine, Annealing, Argon, Chemical species

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Proceedings Article | 15 March 2019 Paper

Paper

Influence of annealing on nanocrystalline LiNbO3 films properties

Viktor Klimin, Zakhar Vakulov, Roman Tominov, Yuriy Varzarev, Iosif Clemente, Andrew Miakonkikh, Konstantin Rudenko, Oleg Ageev

Proceedings Volume 11022, 110221E (2019) https://doi.org/10.1117/12.2522316

KEYWORDS: Annealing, Oxygen, Surface roughness, Scanning electron microscopy, Absorption, Oxides, Fabrication, Atmospheric modeling, Atmospheric optics, Acousto-optics

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Proceedings Article | 15 March 2019 Paper

Paper

Cyclic discrete etching of Silicon oxide in deposition-sputtering cycles: towards to ALE

V. Kuzmenko, A. Miakonkikh, K. Rudenko

Proceedings Volume 11022, 1102225 (2019) https://doi.org/10.1117/12.2522472

KEYWORDS: Etching, Plasma, Polymers, Silicon, Semiconducting wafers, Oxides, Polymer thin films, Argon, Focus stacking software, Oxygen

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Proceedings Article | 15 March 2019 Paper

Paper

Study of synergy phenomena for atomic layer etching of aluminum and hafnium oxides

V. Kuzmenko, A. Miakonkikh, K. Rudenko

Proceedings Volume 11022, 1102226 (2019) https://doi.org/10.1117/12.2522473

KEYWORDS: Etching, Aluminum, Focus stacking software, Adsorption, Plasma, Plasma etching, Oxides, Semiconducting wafers, Hafnium, Argon

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Proceedings Article | 15 March 2019 Paper

Paper

Fabrication and properties of SOI-based planar silicon nanowire arrays

Alexander Rogozhin, Andrey Miakonkikh, Andrey Tatarintsev, Konstantin Rudenko

Proceedings Volume 11022, 1102222 (2019) https://doi.org/10.1117/12.2522457

KEYWORDS: Silicon, Nanowires, Oxidation, Plasma etching, Nanolithography, Wet etching

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Proceedings Article | 15 March 2019 Paper

Paper

Deep silicon plasma etching: selection of processes for different applications

A. Miakonkikh, S. Averkin, K. Rudenko, V. Lukichev

Proceedings Volume 11022, 110221X (2019) https://doi.org/10.1117/12.2522505

KEYWORDS: Etching, Silicon, Plasma, Oxidation, Oxides, Semiconducting wafers, Plasma etching, Photomasks, Oxygen, Fluorine

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Proceedings Article | 15 March 2019 Paper

Paper

Tunnel undoped multiple-gate field-effect transistor with Schottky contacts

V. Vyurkov, A. Krivospitsky, A. Miakonkikh, Yu. Semin, K. Rudenko, V. Lukichev

Proceedings Volume 11022, 1102205 (2019) https://doi.org/10.1117/12.2522495

KEYWORDS: Transistors, Doping, Field effect transistors, Silicon, Magnesium, Dielectrics, Metals, Semiconductors, Graphene, Plasma etching

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Proceedings Article | 15 March 2019 Paper

Paper

Barrier-injection transit-time diodes and transistors for terahertz generation and detection

V. Vyurkov, A. Miakonkikh, A. Rogozhin, M. Rudenko, K. Rudenko, V. Lukichev

Proceedings Volume 11022, 1102202 (2019) https://doi.org/10.1117/12.2522493

KEYWORDS: Diodes, Terahertz radiation, Scattering, Transistors, Antennas, Silicon, Millimeter wave sensors, Particles, Solid state electronics, Nanowires

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Proceedings Article | 30 December 2016 Paper

Paper

Optical emission 2D-tomography of plasma: case of rectangular two-view scanning and diagonal symmetry of inhomogeneities

A. Fadeev, K. Rudenko

Proceedings Volume 10224, 102242D (2016) https://doi.org/10.1117/12.2266838

KEYWORDS: Tomography, Plasma, Reconstruction algorithms, Atmospheric particles, Algorithm development, Fluctuations and noise, Sensors, Microelectronics, Superposition, Diagnostics

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Proceedings Article | 30 December 2016 Paper

Paper

Silicon ohmic lateral-contact MEMS switch for RF applications

A. Rogozhin, A. Miakonkikh, A. Tatarintsev, K. Lebedev, V. Kalnov, K. Rudenko, V. Lukichev

Proceedings Volume 10224, 1022419 (2016) https://doi.org/10.1117/12.2267093

KEYWORDS: Switches, Microelectromechanical systems, Silicon, Electrodes, Etching, Dry etching, Control systems, Electron beam lithography, Fluorine, Semiconducting wafers

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Proceedings Article | 30 December 2016 Paper

Paper

Low-damage plasma etching of porous low-k films in CF3Br and CF4 plasmas under low-temperature conditions

A. Miakonkikh, I. Clemente, A. Vishnevskiy, K. Rudenko, M. Baklanov

Proceedings Volume 10224, 1022420 (2016) https://doi.org/10.1117/12.2267113

KEYWORDS: Cryogenics, Plasma etching, Plasma, Dielectrics, Etching, Bromine, FT-IR spectroscopy, Polymers, Fluorine, Diffusion

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Proceedings Article | 30 December 2016 Paper

Paper

Technology for fabrication of sub-20 nm silicon planar nanowires array

Andrey Miakonkikh, Andrey Tatarintsev, Alexander Rogozhin, Konstantin Rudenko

Proceedings Volume 10224, 102241V (2016) https://doi.org/10.1117/12.2267112

KEYWORDS: Nanowires, Oxidation, Silicon, Reactive ion etching, Thermal oxidation, Etching, Plasma etching, Wet etching, Plasma, Electron beam lithography

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Proceedings Article | 30 December 2016 Paper

Paper

Elements for hard X-ray optics produced by cryogenic plasma etching of silicon

Andrey Miakonkikh, Alexander Rogozhin, Konstantin Rudenko, Vladimir Lukichev, Vyacheslav Yunkin, Anatoly Snigirev

Proceedings Volume 10224, 1022421 (2016) https://doi.org/10.1117/12.2266471

KEYWORDS: Optical components, Hard x-rays, X-ray optics, Silicon, Interferometers, Etching, Cryogenics, Plasma etching, Atomic force microscopy, Plasma

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Proceedings Article | 30 December 2016 Paper

Paper

Low-dimensional transit-time diodes for terahertz generation

R. Khabutdinov, I. Semenikhin, F. Davydov, D. Svintsov, V. Vyurkov, L. Fedichkin, K. Rudenko, A. Borzdov, V. Borzdov

Proceedings Volume 10224, 102240M (2016) https://doi.org/10.1117/12.2267243

KEYWORDS: Diodes, Millimeter wave sensors, Nanowires, Scattering, Silicon, Terahertz radiation, Antennas, Laser scattering, Capacitance, Semiconducting wafers

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Proceedings Article | 18 December 2014 Paper

Paper

Carbon and fluorine co-implantation for boron diffusion suppression in extremely ultra shallow junctions

Andrey Miakonkikh, Aleksander Rogozhin, Valeriy Rudakov, Konstantin Rudenko, Vladimir Lukichev

Proceedings Volume 9440, 94400L (2014) https://doi.org/10.1117/12.2181006

KEYWORDS: Boron, Annealing, Carbon, Silicon, Plasma, Fluorine, Ions, Diffusion, Doping, Semiconducting wafers

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Proceedings Article | 18 December 2014 Paper

Paper

Monte Carlo simulation of boron doping profile of fin and trench structures by plasma immersion ion implantation

Izat Shahsenov, Andrey Miakonkikh, Kostantin Rudenko

Proceedings Volume 9440, 94400Y (2014) https://doi.org/10.1117/12.2181068

KEYWORDS: Plasma, Ions, Boron, Doping, Ion implantation, Photomasks, Monte Carlo methods, 3D modeling, Semiconducting wafers, Scattering

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Proceedings Article | 3 January 2013 Paper

Paper

Instrumented wafer as a Langmuir multiprobe tool for lateral plasma homogeneity measurements in processing plasma reactors

A. Miakonkikh, S. Lisovsky, M. Rudenko, K. Rudenko

Proceedings Volume 8700, 870004 (2013) https://doi.org/10.1117/12.2017556

KEYWORDS: Plasma, Ions, Semiconducting wafers, Argon, Temperature metrology, Helium, Contamination, Microelectronics, Magnetism, Materials processing

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Proceedings Article | 29 April 2008 Paper

Paper

Langmuir probe applications in monitoring of plasma etching

Andrey Miakonkikh, Konstantin Rudenko, Alexander Orlikovsky

Proceedings Volume 7025, 70250F (2008) https://doi.org/10.1117/12.802362

KEYWORDS: Plasma, Etching, Electrons, Plasma etching, Argon, Semiconducting wafers, Ions, Silicon, Oxides, Silica

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Proceedings Article | 9 July 2007 Paper

Paper

Picosecond biharmonic pumping technique in measurements of HTSC energy gap width

Yu. Bobyrev, V. M. Petnikova, K. V. Rudenko, V. V. Shuvalov

Proceedings Volume 6727, 672707 (2007) https://doi.org/10.1117/12.752226

KEYWORDS: Picosecond phenomena, Nonlinear response, Transmittance, Phonons, Data modeling, Acoustics, Scattering, Tellurium, Technetium, Superconductors

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Proceedings Article | 25 April 2007 Paper

Paper

Training of self-pumped phase-conjugate mirrors based on photorefractive nonlinearity

Konstantin Rudenko, Vladimir Shuvalov, Mehran Vahdani Mogaddam

Proceedings Volume 6606, 660608 (2007) https://doi.org/10.1117/12.729506

KEYWORDS: Mirrors, Modulation, Holograms, Phase conjugation, Phase shift keying, Gaussian beams, Solids, Wavefronts, Crystals, Nonlinear response

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Proceedings Article | 14 June 2006 Paper

Paper

Phase-conjugation dynamics in self-pumping photorefractive loop mirrors

K. Rudenko, V. Shuvalov, M. Moghaddam

Proceedings Volume 6259, 62590R (2006) https://doi.org/10.1117/12.677889

KEYWORDS: Mirrors, Atrial fibrillation, Sodium, Holograms, Radon, Refractive index, Information operations, Modulation, Wave propagation, Neodymium

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Proceedings Article | 10 June 2006 Paper

Paper

Dynamics of self-pumping photorefractive double phase-conjugate mirrors

Konstantin Rudenko, Mehran Mogaddam, Vladimir Shuvalov

Proceedings Volume 6344, 634419 (2006) https://doi.org/10.1117/12.694291

KEYWORDS: Mirrors, Phase conjugation, Holograms, Atrial fibrillation, Sodium, Astatine, Rutherfordium, Crystals, Complex systems, Neodymium

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Proceedings Article | 10 June 2006 Paper

Paper

Measurement of polymerizing fluorocarbon plasma parameters: dynamic Langmuir probe technique application

A. Miakonkikh, K. Rudenko

Proceedings Volume 6260, 62600A (2006) https://doi.org/10.1117/12.677021

KEYWORDS: Plasma, Polymers, Ions, Argon, Contamination, Polymer thin films, Switching, Adsorption, Tungsten, Particles

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Proceedings Article | 10 June 2006 Paper

Paper

Anomalous kinetics of nonlinear response in pump-probe spectroscopy of HTSC

Yuri Bobyrev, Vera Petnikova, Konstantin Rudenko, Vladimir Shuvalov

Proceedings Volume 6344, 63441L (2006) https://doi.org/10.1117/12.694414

KEYWORDS: Neon, Tellurium, Spectroscopy, Phonons, Quantum efficiency, Nonlinear response, Particles, Beryllium, Actinium, Absorption

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Proceedings Article | 10 June 2006 Paper

Paper

Ultra shallow p+-n junctions in Si produced by plasma immersion ion implantation

K. Rudenko, S. Averkin, V. Lukichev, A. Orlikovsky, A. Pustovit, A. Vyatkin

Proceedings Volume 6260, 626003 (2006) https://doi.org/10.1117/12.676912

KEYWORDS: Plasma, Ions, Boron, Semiconducting wafers, Doping, Silicon, Fluorine, Etching, Annealing, Ion implantation

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Proceedings Article | 7 June 2005 Paper

Paper

Long-living meta-stable non-equilibrium states of HTSC compounds in transient four-photon spectroscopy

Yu. Bobyrev, V. Petnikova, K. Rudenko, V. Shuvalov, A. Voronov

Proceedings Volume 5850, (2005) https://doi.org/10.1117/12.633662

KEYWORDS: Metals, Nonlinear response, Superconductors, Spectroscopy, Data modeling, Picosecond phenomena, Information technology, Tellurium, Solids, Temperature metrology

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Proceedings Article | 7 June 2005 Paper

Paper

Writing the regular domain structures in ultra-thin ferromagnetic films by short trains of ultra-short laser pulses

V. Petnikova, K. Rudenko, V. Shuvalov, A. Voronov

Proceedings Volume 5850, (2005) https://doi.org/10.1117/12.633743

KEYWORDS: Electrons, Laser applications, Magnetism, Pulsed laser operation, Information operations, Picosecond phenomena, Nickel, Monte Carlo methods, Diffusion, Ferromagnetics

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Proceedings Article | 28 May 2004 Paper

Paper

Tomographic reconstruction of space plasma inhomogeneities in wide-aperture plasma sources under strong restriction on the points of view

Konstantin Rudenko, A. Fadeev, Alexander Orlikovsky, K. Valiev

Proceedings Volume 5401, (2004) https://doi.org/10.1117/12.557252

KEYWORDS: Reconstruction algorithms, Plasma, Tomography, Algorithm development, Image analysis, Charged particle optics, Optics manufacturing, Optical tomography, Atmospheric particles, Semiconducting wafers

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Proceedings Article | 28 May 2004 Paper

Paper

Comparative study of inductively coupled and microwave BF3 plasmas for microelectronic technology applications

Yakov Sukhanov, Alexey Ershov, Konstantin Rudenko, Alexander Orlikovsky

Proceedings Volume 5401, (2004) https://doi.org/10.1117/12.556998

KEYWORDS: Plasmas, Ions, Microwave radiation, Semiconducting wafers, Magnetism, Argon, Tellurium, Microelectronics, Diagnostics, Boron

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Proceedings Article | 29 May 2002 Paper

Paper

Ultrafast cooling of electronic subsystem in ultrathin metal films

V. Petnikova, K. Rudenko, Vladimir Shuvalov

Proceedings Volume 4752, (2002) https://doi.org/10.1117/12.469101

KEYWORDS: Metals, Nickel, Scattering, Ultrafast phenomena, Spectroscopy, Gold, Nonlinear response, Platinum, Picosecond phenomena, Data modeling

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Showing 5 of 32 publications

Proceedings Volume Editor (3)

SPIE Conference Volume | 30 January 2022

International Conference on Micro- and Nano-Electronics 2021

SPIE Conference Volume | 15 March 2019

International Conference on Micro- and Nano-Electronics 2018

SPIE Conference Volume | 26 January 2017

International Conference on Micro- and Nano-Electronics 2016

Conference Committee Involvement (4)

International Conference on Micro- and Nano-Electronics 2021

4 October 2021 | Zvenigorod, Russian Federation

The International Conference on Micro- and Nano-Electronics 2018

1 October 2018 | Zvenigorod, Russian Federation

The International Conference on Micro- and Nano-Electronics 2018

1 October 2018 | Zvenigorod, Russian Federation

The International Conference on Micro- and Nano-Electronics 2016

3 October 2016 | Zvenigorod, Russian Federation

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