Understanding the parameters for strong phase-shift mask lithography

Alexander V. Tritchkov; John P. Stirniman; Jeffrey P. Mayhew; Michael L. Rieger

doi:10.1117/12.388970

5 July 2000 Understanding the parameters for strong phase-shift mask lithography

Alexander V. Tritchkov, John P. Stirniman, Jeffrey P. Mayhew, Michael L. Rieger

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388970
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In this paper we analyze selective alternating PSM synthesis and OPC modeling parameters, taking into account lithographic constraints to PSM conformance. The results shown include phase and trim regions size and shape impact on the images printed on wafers at optimum conditions and through focus, at ideal as well as in the presence of errors in phase and transmission due to mask manufacturing.

Citation Download Citation

Alexander V. Tritchkov, John P. Stirniman, Jeffrey P. Mayhew, and Michael L. Rieger "Understanding the parameters for strong phase-shift mask lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388970

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