Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

Shyamala Subramanian; Jeffrey M. Catchmark

doi:10.1117/1.2401140

1 October 2006 Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

Shyamala Subramanian, Jeffrey M. Catchmark

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 4, 049701 (October 2006). https://doi.org/10.1117/1.2401140

Abstract

Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Shyamala Subramanian and Jeffrey M. Catchmark "Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(4), 049701 (1 October 2006). https://doi.org/10.1117/1.2401140

Published: 1 October 2006

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