Formation of uniform nanoscale oxide layers assembled by overlapping oxide lines using atomic force microscopy

Ampere A. Tseng; Tae-Woo Lee; Andrea Notargiacomo; Tupei Chen

doi:10.1117/1.3268427

1 October 2009 Formation of uniform nanoscale oxide layers assembled by overlapping oxide lines using atomic force microscopy

Ampere A. Tseng, Tae-Woo Lee, Andrea Notargiacomo, Tupei Chen

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 4, 043050 (October 2009). https://doi.org/10.1117/1.3268427

Abstract

Atomic force microscopy (AFM) has been widely used for creating nanoscale oxide lines on various material surfaces. The assembling technique used for overlapping an array of these oxide lines into a uniform oxide layer is analytically investigated and experimentally verified. The experimental data of the oxide lines induced at different scanning speeds are analytically correlated to provide the basic formula for the assembling technique. The superposition principle is then applied for simulating the assembling process to extract the criteria for assembling a uniform layer. Experiments have been conducted to verify the reliability of the uniformity criteria analytically obtained and the feasibility of the assembling technique developed. Indeed, a uniform oxide layer can be precisely assembled by following the uniformity criteria developed.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Ampere A. Tseng, Tae-Woo Lee, Andrea Notargiacomo, and Tupei Chen "Formation of uniform nanoscale oxide layers assembled by overlapping oxide lines using atomic force microscopy," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043050 (1 October 2009). https://doi.org/10.1117/1.3268427

Published: 1 October 2009

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