Mr. Chris L. Cohan Profile

Chris L. Cohan

at SEMATECH Inc

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 12 June 2003 Paper

Evaluation of process-based resolution enhancement techniques to extend 193-nm lithography

Sripadma Satyanarayana, Chris Cohan

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485156

KEYWORDS: Semiconducting wafers, Photoresist processing, Etching, Resolution enhancement technologies, Lithography, 193nm lithography, Photomasks, Scanning electron microscopy, Oxides, Phase shifts

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years