Mr. Christian Sparka Profile

Christian Sparka

at KLA GmbH

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Author

Publications (6)

Proceedings Article | 19 March 2015 Paper

HVM capabilities of CPE run-to-run overlay control

Lokesh Subramany, Woong Jae Chung, Karsten Gutjahr, Miguel Garcia-Medina, Christian Sparka, Lipkong Yap, Onur Demirer, Ramkumar Karur-Shanmugam, Brent Riggs, Vidya Ramanathan, John Robinson, Bill Pierson

Proceedings Volume 9424, 94241V (2015) https://doi.org/10.1117/12.2190852

KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Optical parametric oscillators, Scanners, Process control, High volume manufacturing, Metrology, Yield improvement, Error analysis

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Proceedings Article | 2 April 2014 Paper

In-line focus monitoring and fast determination of best focus using scatterometry

Steven Thanh Ha, Benjamin Eynon, Melany Wynia, Jeff Schmidt, Christian Sparka, Antonio Mani, Roie Volkovich, SeungHoon Yoon, David Tien, John Robinson, Saroja Ramamurthi

Proceedings Volume 9050, 90502Y (2014) https://doi.org/10.1117/12.2047576

KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Optical design, Scatter measurement, Finite element methods, Metrology, Semiconductors, Matrices, Lithography

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Proceedings Article | 24 March 2009 Paper

Automated overlay recipe setup in high-volume manufacturing: improving performance, efficiency, and robustness

Christian Sparka, Anna Golotsvan, Yosef Avrahamov, Wolfgang Sitzmann, David Tien

Proceedings Volume 7272, 727232 (2009) https://doi.org/10.1117/12.814338

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Optical alignment, Time metrology, Databases, High volume manufacturing, Semiconductors, Intelligence systems, Image processing

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Proceedings Article | 24 March 2009 Paper

Overlay mark optimization using the KTD signal simulation system

Anat Marchelli, Karsten Gutjahr, Michael Kubis, Christian Sparka, Mark Ghinovker, Alessandra Navarra, Amir Widmann

Proceedings Volume 7272, 72722Y (2009) https://doi.org/10.1117/12.813594

KEYWORDS: Image segmentation, Signal processing, Semiconducting wafers, Metals, Overlay metrology, Metrology, Photomasks, Databases, Optical design, Data modeling

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Proceedings Article | 16 April 2008 Paper

Overlay control using scatterometry based metrology (SCOM) in production environment

Berta Dinu, Stefan Fuchs, Uwe Kramer, Michael Kubis, Anat Marchelli, Alessandra Navarra, Christian Sparka, Amir Widmann

Proceedings Volume 6922, 69222S (2008) https://doi.org/10.1117/12.771581

KEYWORDS: Overlay metrology, Scatterometry, Metrology, Semiconducting wafers, Signal processing, Lithography, Wafer testing, Sensors, Optical design, Spectroscopy

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Proceedings Article | 24 March 2006 Paper

Lithography rework reduction and improved process control using AIM targets on aluminum layers in the high-volume production of 110-nm DRAM devices

Detlef Hofmann, Frank Rabe, Yosef Avrahamov, Christian Sparka

Proceedings Volume 6152, 61522B (2006) https://doi.org/10.1117/12.653360

KEYWORDS: Aluminum, Overlay metrology, Process control, Etching, Semiconducting wafers, Data modeling, Lithography, Metrology, Sputter deposition, Metals

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Showing 5 of 6 publications

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