Dr. Conrad Wolke
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 March 2018 Paper
Renzo Capelli, Dirk Hellweg, Martin Dietzel, Markus Koch, Conrad Wolke, Grizelda Kersteen
Proceedings Volume 10583, 1058311 (2018) https://doi.org/10.1117/12.2297681
KEYWORDS: Extreme ultraviolet, Photomasks, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Scanners, Semiconducting wafers, Image processing, Scanning electron microscopy, Metrology

Proceedings Article | 16 October 2017 Paper
Dirk Hellweg, Martin Dietzel, Renzo Capelli, Conrad Wolke, Grizelda Kersteen, Markus Koch, Ralf Gehrke
Proceedings Volume 10451, 104510J (2017) https://doi.org/10.1117/12.2280689
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Stochastic processes, Extreme ultraviolet lithography, Scanners, 3D metrology, Line width roughness, Manufacturing, Lithography

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