KEYWORDS: Semiconductors, Plasma, Process engineering, Process modeling, Ions, Very large scale integration, Tolerancing, Semiconductor process engineering, Gases, Etching
We present a multi-fidelity process simulator ‘VizGlow-MPS’ that combines well-established high-fidelity models with a reduced-order model surrogate. The high-fidelity model provides experimentally validated results for equipment operation that informs the reduced-order model that predicts results in a few minutes of wall-clock time. The approach constitutes a ‘digital twin’ for process reactors with multiple levels of fidelity that a process engineering can choose from. This approach is demonstrated on c-C4F8 inductively coupled plasma and pulsed CF4/H2 capacitively coupled plasma widely used in etching applications.
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