Mr. Jiwan Han Profile

Jiwan Han

at Siemens EDA

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Publications (2)

Proceedings Article | 20 March 2018 Presentation + Paper

Constraint approaches for some inverse lithography problems with pixel-based mask

Sergey Kobelkov, Victoria Roizen, Sergei Rodin, Alexander Tritchkov, JiWan Han, Yuri Granik

Proceedings Volume 10587, 105870I (2018) https://doi.org/10.1117/12.2297262

KEYWORDS: Photomasks, Lithography, Source mask optimization, Optical lithography

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Proceedings Article | 24 March 2016 Paper

Controlling bridging and pinching with pixel-based mask for inverse lithography

Sergey Kobelkov, Alexander Tritchkov, JiWan Han

Proceedings Volume 9778, 97782X (2016) https://doi.org/10.1117/12.2219281

KEYWORDS: Lithography, Photomasks, Computational lithography, Critical dimension metrology, Defect detection, Optical proximity correction, Photovoltaics, Optical lithography, Visualization, Distance measurement, Bromine, Ions

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