Dr. Luigi Raffaele Profile

Dr. Luigi Raffaele

at DNP Photomask Europe

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Publications (1)

Proceedings Article | 9 November 2005 Paper

Characterization and qualification of the Jeol JBX9000-MVII e-beam writer for the 90nm node and its integration in a photomask manufacturing line

Luigi Raffaele, Carlo Pogliani, Gian Luca Cassol, Giovanni Bianucci, Shiaki Murai, Shoichi Murata, Ryugo Hikichi, Hidenao Katsuki, Shigeru Noguchi

Proceedings Volume 5992, 59924W (2005) https://doi.org/10.1117/12.632399

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Calibration, Critical dimension metrology, Chromium, Photoresist processing, Error analysis, SRAF, Lithography

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