Ms. Mi-Rim Jung Profile

Mi-Rim Jung

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 30 March 2017 Paper

Process resilient overlay target designs for advanced memory manufacture

Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu

Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376

KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

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Proceedings Article | 24 March 2016 Paper

Lithography aware overlay metrology target design method

Myungjun Lee, Mark Smith, Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Kangsan Lee, Dohwa Lee, Dongsub Choi, Zephyr Liu, Tal Itzkovich, Vladimir Levinski, Ady Levy

Proceedings Volume 9778, 97781L (2016) https://doi.org/10.1117/12.2218653

KEYWORDS: Overlay metrology, Metrology, Lithography, Scanners, Lithographic illumination, Personal protective equipment, Optical lithography, Resolution enhancement technologies, Optical proximity correction, Photomasks, SRAF

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Proceedings Article | 19 March 2015 Paper

Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Young-Sik Kim, Young-Sun Hwang, Mi-Rim Jung, Ji-Hwan Yoo, Won-Taik Kwon, Kevin Ryan, Paul Tuffy, Youping Zhang, Sean Park, Nang-Lyeom Oh, Chris Park, Mir Shahrjerdy, Roy Werkman, Kyu-Tae Sun, Jin-Moo Byun

Proceedings Volume 9424, 942414 (2015) https://doi.org/10.1117/12.2085645

KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching

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Proceedings Article | 29 March 2006 Paper

Reflow modeling for elongated contact hole shape

Ji-Eun Lee, Dai-Gyoung Kim, Kang Baek Kim, Mi-Rim Jung, Hye-Young Kang, Jong-Sun Kim, Joo-Yoo Hong, Hye-Keun Oh, Jun-Tack Park

Proceedings Volume 6153, 61533T (2006) https://doi.org/10.1117/12.656286

KEYWORDS: Photoresist processing, Interfaces, Critical dimension metrology, Glasses, Resolution enhancement technologies, Optical proximity correction, Thin films, Mathematical modeling, Lithography, Motion models

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Proceedings Article | 21 March 2006 Paper

Evaluation of partial coherent imaging using the transfer function in immersion lithography

Mi-Rim Jung, Eun-A Kwak, Hye-Keun Oh, Seong-Bo Shim, Na-Rak Choi, Jai-Soon Kim

Proceedings Volume 6154, 61542R (2006) https://doi.org/10.1117/12.656983

KEYWORDS: Polarization, Immersion lithography, Resolution enhancement technologies, Refractive index, Photomasks, Modulation transfer functions, Lithographic illumination, Image quality, Coherence imaging, Liquids

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Proceedings Article | 21 March 2006 Paper

Simulation of mask induced polarization effect on imaging in immersion lithography

Eun-A Kwak, Mi-Rim Jung, Dai-Gyoung Kim, Ji-Eun Lee, Hye-Keun Oh, Sook Lee

Proceedings Volume 6154, 61542T (2006) https://doi.org/10.1117/12.656204

KEYWORDS: Photomasks, Polarization, Diffraction, Immersion lithography, Finite-difference time-domain method, Binary data, Silicon, Semiconductors, Lithographic illumination, Refractive index

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Showing 5 of 6 publications

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