Mr. Rory de Zanger Profile

Rory de Zanger

at TNO

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Author

Publications (2)

Proceedings Article | 26 September 2019 Paper

EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility

Herman Bekman, Michael Dekker, Rob Ebeling, Jochem Janssen, Norbert Koster, Joop Meijlink, Freek Molkenboer, Kyri Nicolai, Michel van Putten, Corné Rijnsent, Arnold Storm, Jetske Stortelder, Chien-Ching Wu, Rory de Zanger

Proceedings Volume 11147, 1114706 (2019) https://doi.org/10.1117/12.2536531

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Temperature metrology, Mirrors, Contamination, Ruthenium

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Proceedings Article | 27 June 2019 Open Access

Lifetime test on EUV photomask with EBL2

Chien-Ching Wu, Markus Bender, Rik Jonckheere, Frank Scholze, Herman Bekman, Michel van Putten, Rory de Zanger, Rob Ebeling, Jeroen Westerhout, Kyri Nicolai, Jacqueline van Veldhoven, Véronique de Rooij-Lohmann, Olaf Kievit, Alex Deutz

Proceedings Volume 11178, 111780E (2019) https://doi.org/10.1117/12.2537734

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Scanners, Reflectivity, Oxidation, Ruthenium

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