Mr. Ruixuan Wu Profile

Ruixuan Wu

at Institute of Microelectronics of the CAS

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Publications (2)

Proceedings Article | 20 September 2020 Poster + Paper

Analysis and mitigation of forbidden pitch effects for EUV lithography

Ling Ma, Lisong Dong, Taian Fan, Xiaojing Su, Jianfang He, Ruixuan Wu, Yumei Zhou, Yayi Wei

Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145

KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

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Proceedings Article | 26 September 2019 Paper

A method for compensating lithographic influence of EUV mask blank defects by an advanced genetic algorithm

Ruixuan Wu, Lisong Dong, Rui Chen, Tianchun Ye, Yayi Wei

Proceedings Volume 11147, 111471U (2019) https://doi.org/10.1117/12.2536796

KEYWORDS: Photomasks, Lithography, Genetic algorithms, Extreme ultraviolet, Extreme ultraviolet lithography, Detection and tracking algorithms, Image quality, Manufacturing, High volume manufacturing, Optical proximity correction

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