Mr. Shih-Ming Chang Profile

Shih-Ming Chang

at Taiwan Semiconductor Manufacturing Co Ltd

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Author

Publications (6)

Proceedings Article | 19 March 2018 Paper

Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Chun-Hung Liu, Shih-Ming Chang, Chia-Hua Chang, Wen Lo, Hsin-Wei Wu, Chien-Cheng Chen, Alex Chen, Shuo-Yen Chou, Ru-Gun Liu

Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685

KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

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Proceedings Article | 28 March 2008 Paper

High throughput maskless lithography: low voltage versus high voltage

S. W. H. Steenbrink, B. Kampherbeek, M. Wieland, J. Chen, S. Chang, M. Pas, J. Kretz, C. Hohle, D. van Steenwinckel, S. Manakli, J. Le-Denmat, L. Pain

Proceedings Volume 6921, 69211T (2008) https://doi.org/10.1117/12.771971

KEYWORDS: Semiconducting wafers, Scattering, Silicon, Critical dimension metrology, Electron beam lithography, Laser scattering, Lenses, Lithography, Modulation transfer functions, Maskless lithography

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Proceedings Article | 20 March 2008 Paper

Patterning fidelity on low-energy multiple-electron-beam direct write lithography

S. M. Chang, S. J. Lin, C. A. Lin, J. H. Chen, T. S. Gau, Burn Lin, P. Veltman, R. Hanfoug, E. Slot, M. Wieland, B. Kampherbeek

Proceedings Volume 6921, 69211R (2008) https://doi.org/10.1117/12.771392

KEYWORDS: Electrons, Line width roughness, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Optical simulations, Lithography, Raster graphics, Image resolution

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Proceedings Article | 17 December 2003 Paper

Mask pattern fidelity quantification

Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng Chin, Chi-Lun Lu, Angus S.J. Chin, Hung-Chang Hsieh, Shinn-Sheng Yu

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518041

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Image processing, Lithography, Image analysis, Image enhancement, Scanning electron microscopy, Photoresist processing, Logic

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Proceedings Article | 17 December 2003 Paper

Global CD uniformity improvement in mask manufacturing for advanced lithography

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Ren-Guey Hsieh, Cherng-Shyan Tsay, Yung-Sung Yen, Sheng-Chi Chin, Hsin-Chang Lee, Ru-Gun Liu, Kuei-Shun Chen, Hung-Chang Hsieh, Yao Ku, John Lin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518008

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Manufacturing, Inspection, Etching, Software development, Semiconductor manufacturing, Control systems

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Proceedings Article | 28 August 2003 Paper

Study of loading effect on dry etching process

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Hong-Chang Hsieh

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504193

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photomasks, Optical lithography, Control systems, Manufacturing, Mask making, Cadmium, Inspection

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Showing 5 of 6 publications

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