Dr. Si Li Profile

Dr. Si Li

at Brewer Science

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 9 April 2024 Presentation + Paper

Lithography performance improvement of MOR by underlayers

Si Li, Xinlin Lu, Stephen Grannemann, Daniel Sweat, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Vandana Krishnamurthy, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 1295715 (2024) https://doi.org/10.1117/12.3010887

KEYWORDS: Polymers, Film thickness, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Coating, Tin, Silicon, Diffusion

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Proceedings Article | 9 April 2024 Poster + Paper

Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials

Si Li, Daniel Sweat, Xinlin Lu, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 129571T (2024) https://doi.org/10.1117/12.3010498

KEYWORDS: Polymers, Extreme ultraviolet lithography, Line width roughness, Lithography, Adhesives, Adhesion, Extreme ultraviolet

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Proceedings Article | 9 April 2024 Presentation + Paper

Functional underlayers, surface priming, and multilayer stacks to improve dose and adhesion of EUV photoresists

Roberto Fallica, Lander Verstraete, Weizhong Huang, Mihir Gupta, Danilo De Simone, Si (Elly) Li, Daniel Sweat, Douglas Guerrero, Kodai Kato

Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

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Proceedings Article | 1 May 2023 Presentation + Paper

Novel assist layers to enhance EUV lithography performance of photoresists on different substrates

Si Li, Joyce Lowes, Ruimeng Zhang, Ming Luo, Kelsey Brakensiek, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12498, 124980N (2023) https://doi.org/10.1117/12.2658529

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Coating, Coating thickness, Silicon, Photoresist materials, Adhesion, Line width roughness, Resistance, Adhesives

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