Tae-Seung Eom
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 1 April 2013 Paper
Tae-Seung Eom, Hong-Ik Kim, Choon-Ky Kang, Yoon-Jung Ryu, Seung-Hyun Hwang, Ho-Hyuk Lee, Hee-Youl Lim, Jeong-Su Park, Noh-Jung Kwak, Sungki Park
Proceedings Volume 8679, 86791J (2013) https://doi.org/10.1117/12.2011687
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Optical proximity correction, Manufacturing, Scanners, Photomasks, Critical dimension metrology, Overlay metrology, Line width roughness

Proceedings Article | 2 April 2010 Paper
Sarohan Park, Eun-Ha Lee, Eun-Kyoung Shin, Yoon-Jung Ryu, Hye-Jin Shin, Seung-Hyun Hwang, Hee-Youl Lim, Kyu-Tae Sun, Tae-Seung Eom, Noh-Jung Kwak, Sung-Ki Park
Proceedings Volume 7638, 76382H (2010) https://doi.org/10.1117/12.846489
KEYWORDS: Semiconducting wafers, Overlay metrology, Chemical mechanical planarization, Process control, Distortion, Photomasks, Optical alignment, Optical lithography, Data modeling, Control systems

Proceedings Article | 4 March 2010 Paper
Tae-Seung Eom, Eun-Kyoung Shin, Eun-Ha Lee, Yoon-Jung Ryu, Jun-Taek Park, Sunyoung Koo, Hye-Jin Shin, Seung-Hyun Hwang, Hee-Youl Lim, Sarohan Park, Kyu-Tae Sun, Noh-Jung Kwak, Sung-Ki Park
Proceedings Volume 7640, 76402J (2010) https://doi.org/10.1117/12.846728
KEYWORDS: Photomasks, Binary data, Transmittance, Diffraction, Chromium, Polarization, Lithography, Scanners, Nanoimprint lithography, Optical lithography

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711G (2009) https://doi.org/10.1117/12.814407
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanners, Critical dimension metrology, Extreme ultraviolet, Silicon, Optical lithography, Deep ultraviolet, Semiconducting wafers, Laser scanners

Proceedings Article | 18 March 2009 Paper
Tae-Seung Eom, Sarohan Park, Jun-Taek Park, Chang-Moon Lim, Sunyoung Koo, Yoon-Suk Hyun, HyeongSoo Kim, Byung-Ho Nam, Chang-Reol Kim, Seung-Chan Moon, Noh-Jung Kwak, Sungki Park
Proceedings Volume 7271, 727115 (2009) https://doi.org/10.1117/12.814378
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Double patterning technology, Lithography, Etching, Critical dimension metrology, Scanners, Immersion lithography

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71401K (2008) https://doi.org/10.1117/12.804651
KEYWORDS: Photomasks, Optical lithography, Reflectivity, Immersion lithography, Lithography, Image processing, Image enhancement, Polarization, Semiconducting wafers, Transmittance

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244V (2008) https://doi.org/10.1117/12.772446
KEYWORDS: Transistors, Optical lithography, Photomasks, Lithography, Printing, 3D image processing, Binary data, Critical dimension metrology, Etching, Photoresist processing

Proceedings Article | 7 March 2008 Paper
Tae-Seung Eom, Jun-Taek Park, Jung-Hyun Kang, Sarohan Park, Sunyoung Koo, Jin-Soo Kim, Byoung-Hoon Lee, Chang-Moon Lim, HyeongSoo Kim, Seung-Chan Moon
Proceedings Volume 6924, 69240H (2008) https://doi.org/10.1117/12.772246
KEYWORDS: Photomasks, Chromium, Binary data, Polarization, Pellicles, Diffraction, Scanners, Phase shifts, Lithography, Immersion lithography

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200B (2007) https://doi.org/10.1117/12.712442
KEYWORDS: Polarization, Optical lithography, Photomasks, Birefringence, Transmittance, Scanners, Lithography, Lithographic illumination, Immersion lithography, Critical dimension metrology

Proceedings Article | 12 May 2005 Paper
Chang-Moon Lim, Tae-Seung Eom, Seo-Min Kim, Cheolkyu Bok, Won-Kwang Ma, Gyu-Dong Park, Seung-Chan Moon, Jin-Woong Kim
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600455
KEYWORDS: Lithography, Immersion lithography, Lithographic illumination, Semiconducting wafers, Diffraction, Critical dimension metrology, Reliability, Refractive index, Scanning electron microscopy, Contamination

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599348
KEYWORDS: Lithography, Photoresist processing, Photomasks, Optical proximity correction, Lithographic illumination, Resolution enhancement technologies, Electroluminescence, Image processing, Etching, Semiconducting wafers

Proceedings Article | 4 May 2005 Paper
Geunsu Lee, Tae-Seung Eom, Cheolkyu Bok, Changmoon Lim, Seung-Chan Moon, Jinwoong Kim
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599239
KEYWORDS: Line edge roughness, Photomasks, Line width roughness, Semiconducting wafers, Photoresist processing, Lithography, Photoresist developing, Resist chemistry, Scanning electron microscopy, Polymers

Proceedings Article | 28 May 2004 Paper
Chang-Moon Lim, Seo-Min Kim, Tae-Seung Eom, Seung Chan Moon, Ki Shin
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536357
KEYWORDS: Diffraction, Lithographic illumination, Photomasks, Lithography, Image acquisition, Fourier transforms, Semiconducting wafers, Lead, Spectrum analysis, Mathematics

Proceedings Article | 28 May 2004 Paper
Tae-Seung Eom, Chang-Moon Lim, Min Sung, Seung Chan Moon, Ki Shin
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536346
KEYWORDS: Photomasks, Quartz, Lithography, Transmittance, Optical lithography, Image quality, Optical proximity correction, Etching, Lithographic illumination, Resolution enhancement technologies

Proceedings Article | 26 June 2003 Paper
Tae-Seung Eom, Chang Lim, Seo-Min Kim, Hee-Bom Kim, Se-Young Oh, Won-Kwang Ma, Seung-Chan Moon, Ki Shin
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485452
KEYWORDS: Photomasks, Lithography, Transmittance, Phase shifts, Diffraction, Quartz, Mask making, Etching, Optical lithography, Critical dimension metrology

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474545
KEYWORDS: Lithographic illumination, Optical lithography, Diffusion, Lithography, Photomasks, Resolution enhancement technologies, Electroluminescence, Optical proximity correction, Critical dimension metrology, Image processing

Proceedings Article | 24 July 2002 Paper
Cha-Won Koh, Jin-Soo Kim, Chang-Il choi, Tae-Seung Eom, Won-Taik Kwon, Jae Chang Jung, Cheol-Kyu Bok, Ki-Soo Shin
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474280
KEYWORDS: Photoresist processing, Critical dimension metrology, Semiconducting wafers, Chemically amplified resists, Resolution enhancement technologies, Optical lithography, Lithography, Image processing, Photomasks, Inspection

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435787
KEYWORDS: Lithography, Lithographic illumination, Photomasks, Diffusion, Optical lithography, Critical dimension metrology, Semiconducting wafers, Scanners, Image processing, Lithium

Proceedings Article | 22 January 2001 Paper
Sang-Sool Koo, Hee-Bom Kim, Hyoung-Soon Yune, Jee-Suk Hong, Seung-Weon Paek, Tae-Seung Eom, Chang-Nam Ahn, Young-Mog Ham, Ki-Ho Baik, Kyu-Yong Lee, Lee-Ju Kim, Hong-Seok Kim
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410711
KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Phase shifts, Electroluminescence, Optical lithography, Chromium, Etching, Mask making, Scanning electron microscopy

Proceedings Article | 19 July 2000 Paper
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392047
KEYWORDS: Photomasks, Optical lithography, Diffusion, Critical dimension metrology, Lithography, Transmittance, Semiconducting wafers, Lithographic illumination, Phase shifts, Image processing

Proceedings Article | 30 December 1999 Paper
Tae-Seung Eom, Ikboum Hur, Youngmo Koo, Ki-Ho Baik, Il-Hyun Choi, Do Yun Kim, Chul Shin
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373369
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Mask making, Dry etching, Head, Electroluminescence, Error analysis, Etching, Control systems

Showing 5 of 21 publications
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