Teresa Zoepfl
Ph.D. Student at Technische Univ München
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 19 May 2009 Paper
T. Zöpfl, S. Klare, G. Wachutka, G. Schrag
Proceedings Volume 7362, 73621M (2009) https://doi.org/10.1117/12.821797
KEYWORDS: Etching, Plasma etching, Temperature metrology, Crystals, Polymers, Plasma, Computer simulations, Interferometry, Silicon, Platinum

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