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Sungchan Cho
at KLA Corp
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Publications (1)
Proceedings Article | 20 March 2010 Paper
The analysis of EUV mask defects using a wafer defect inspection system
Kyoung-Yong Cho, Joo-On Park, Changmin Park, Young-Mi Lee, In-Yong Kang, Jeong-Ho Yeo, Seong-Woon Choi, Chan-Hoon Park, Steven Lange, SungChan Cho, Robert Danen, Gregory Kirk, Yeon-Ho Pae
Proceedings Volume 7636, 76361E (2010) https://doi.org/10.1117/12.846482
KEYWORDS: Semiconducting wafers, Photomasks, Line width roughness, Inspection, Wafer inspection, Scanning electron microscopy, Defect detection, Signal to noise ratio, Extreme ultraviolet lithography, Line edge roughness
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