Dr. Chang-Min Park
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 16 April 2024 Presentation + Paper
Il Hwan Kim, Cheolgyu Hyun, Sangho Jo, Muyoung Lee, Ikjun Jang, Jongsu Kim, Jinhong Park, Yigwon Kim, Chang Min Park, Kevin Houchens, Jenny Perry, Nahum Bomshtein, Liad Anokov, Noam Oved, Uri Smolyan, Michael Shifrin, Tal Itzkovich, Jeong Ho Yeo, You Jin Kim, Baek Jun Kim
Proceedings Volume 12955, 129551I (2024) https://doi.org/10.1117/12.3010511
KEYWORDS: Design, Scanning electron microscopy, Overlay metrology, Monte Carlo methods, Electrons, Lithography, Precision measurement, Electron beam lithography, Design rules, Signal detection

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500B (2023) https://doi.org/10.1117/12.2687461
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Optical lithography, Bridges, Scanning electron microscopy, Resistance, Photoresist materials, Extreme ultraviolet, Metals

Proceedings Article | 21 November 2023 Presentation + Paper
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son
Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940V (2023) https://doi.org/10.1117/12.2658345
KEYWORDS: Etching, Extreme ultraviolet lithography, Metal oxides, Coating, Chemical reactions, Process control, Extreme ultraviolet

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249404 (2023) https://doi.org/10.1117/12.2656415
KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Lithography, Optical lithography, Photoresist processing, EUV optics, Chemical composition, Semiconductors

Showing 5 of 26 publications
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