Dr. Takahiro Matsuo
Researcher at Panasonic Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 24 September 2012 Paper
Chris Packham, M. Honda, M. Richter, Y. Okamoto, H. Kataza, T. Onaka, T. Fujiyoshi, A. Tokunaga, M. Chun, A. Alonso-Herrero, J. Carr, M. Chiba, K Enya, H. Fujiwara, P Gandhi, M. Imanishi, K. Ichikawa, Y. Ita, N. Kawakatsu, T. Kotani, N. Levenson, T. Matsuo, M. Matsuura, T. Minezaki, J. Najita, N. Oi, T. Ootsubo, I. Sakon, M. Takami, C. Telesco, C. Wright, T. Yamashita
Proceedings Volume 8446, 84467G (2012) https://doi.org/10.1117/12.924996
KEYWORDS: Stars, Planets, Galactic astronomy, Spatial resolution, Telescopes, Spectroscopy, James Webb Space Telescope, Adaptive optics, Spectral resolution, Thirty Meter Telescope

Proceedings Article | 16 May 2008 Paper
Joanna Pawat, Takahiro Matsuo, Xuefeng Li, Tadashi Sugiyama, Toshitsugu Ueda
Proceedings Volume 7004, 70044R (2008) https://doi.org/10.1117/12.786133
KEYWORDS: Absorption, Laser cutting, Gas sensors, Geometrical optics, Nitrogen, Cladding, Lamps, Molecules, Ion beams, Tunable lasers

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977
KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598532
KEYWORDS: Ions, Immersion lithography, Water, Lithography, Optical lithography, Analytical research, Quartz, Crystals, Semiconducting wafers, Surface roughness

Proceedings Article | 26 June 2003 Paper
Takahiro Matsuo, Akio Misaka, Masaru Sasago
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485363
KEYWORDS: Photomasks, Phase shifts, Lithography, Reticles, Opacity, Critical dimension metrology, Logic devices, Resolution enhancement technologies, Image enhancement, Lithographic illumination

Proceedings Article | 26 June 2003 Paper
Akio Misaka, Takahiro Matsuo, Masaru Sasago
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485319
KEYWORDS: Photomasks, Resolution enhancement technologies, Phase shifting, Phase shifts, Lithography, Critical dimension metrology, Image enhancement, Optical lithography, Printing, Semiconducting wafers

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435642
KEYWORDS: Transmittance, Photomasks, Lithography, Chromium, Tantalum, Phase shifts, Atrial fibrillation, Etching, Thin films, Resolution enhancement technologies

Proceedings Article | 22 January 2001 Paper
Takahiro Matsuo, Toshio Onodera, Toshiro Itani, Hiroaki Morimoto, Takashi Haraguchi, Koichiro Kanayama, Tadashi Matsuo, Masao Otaki
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410703
KEYWORDS: Transmittance, Chromium, Laser irradiation, Atrial fibrillation, Vacuum ultraviolet, Phase shifts, Photomasks, Lithography, Defect inspection, Quartz

Proceedings Article | 19 July 2000 Paper
Keisuke Nakazawa, Takahiro Matsuo, Toshio Onodera, Hiroaki Morimoto, Hiroshi Mohri, Chiaki Hatsuta, Naoya Hayashi
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392100
KEYWORDS: Transmittance, Photomasks, Phase shifts, Lithography, Annealing, Excimer lasers, Interfaces, Fluorine, X-rays, Chromium

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389033
KEYWORDS: Photomasks, Phase shifts, Lithography, Logic devices, Resolution enhancement technologies, Lithographic illumination, Opacity, Binary data, Scanning electron microscopy

Proceedings Article | 30 December 1999 Paper
Toshio Onodera, Takahiro Matsuo, Keisuke Nakazawa, Junji Miyazaki, Tohru Ogawa, Hiroaki Morimoto, Takashi Haraguchi, Nobuhiko Fukuhara, Tadashi Matsuo, Masao Otaki, Susumu Takeuchi
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373329
KEYWORDS: Lithographic illumination, Resolution enhancement technologies, Photomasks, Lithography, Reticles, Transmittance, Critical dimension metrology, Silicon films, Semiconducting wafers, Oxygen

Proceedings Article | 25 August 1999 Paper
Junji Miyazaki, Masaya Uematsu, Keisuke Nakazawa, Takahiro Matsuo, Toshio Onodera, Tohru Ogawa
Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360213
KEYWORDS: Transmittance, Photomasks, Lithography, Critical dimension metrology, Reticles, Phase shifts, Laser irradiation, Binary data, Semiconducting wafers, Error analysis

Proceedings Article | 26 July 1999 Paper
Takahiro Matsuo, Keisuke Nakazawa, Tohru Ogawa
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354342
KEYWORDS: Photomasks, Phase shifts, Lithography, Logic devices, Laser development, Excimer lasers, Photoresist processing, Critical dimension metrology, Optical lithography, Scanning electron microscopy

Proceedings Article | 18 December 1998 Paper
Takahiro Matsuo, Keisuke Nakazawa, Tohru Ogawa
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332866
KEYWORDS: Photomasks, Phase shifts, Lithography, Silicon, Excimer lasers, Laser development, Photoresist processing, Opacity, Silicon films, Scanning electron microscopy

Proceedings Article | 29 June 1998 Paper
Takahiro Matsuo, Masayuki Endo, Shigeyasu Mori, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312340
KEYWORDS: Polymers, Chemical vapor deposition, Photoresist processing, Lithography, Image processing, Scanning electron microscopy, Reactive ion etching, Photography, Lithium, Plasma

Proceedings Article | 29 June 1998 Paper
Shigeyasu Mori, Taku Morisawa, Nobuyuki Matsuzawa, Yuko Kaimoto, Masayuki Endo, Takahiro Matsuo, Koichi Kuhara, Takeshi Ohfuji, Masaru Sasago
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312359
KEYWORDS: Silicon, Etching, Glasses, Lithography, Resistance, Photoresist processing, Liquids, Chemically amplified resists, Image processing, Excimer lasers

Proceedings Article | 29 June 1998 Paper
Masayuki Endo, Takahiro Matsuo, Shigeyasu Mori, Taku Morisawa, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312439
KEYWORDS: Photoresist processing, Polymers, Chemical vapor deposition, Image processing, Lithography, Photolysis, 193nm lithography, Chlorine, Scanning electron microscopy, Etching

Proceedings Article | 22 May 1995 Paper
Taichi Koizumi, Takahiro Matsuo, Masayuki Endo, Masaru Sasago
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209226
KEYWORDS: Critical dimension metrology, Lithography, Silicon, Excimer lasers, Image processing, Photoresist processing, Control systems, Photoresist materials, Atomic force microscope

Proceedings Article | 1 June 1992 Paper
Masayuki Endo, Takahiro Matsuo, Kazuhiko Hashimoto, Masaru Sasago, Noboru Nomura
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59766
KEYWORDS: Lithography, Deep ultraviolet, Excimer lasers, Silicon, Semiconductors, Image resolution, Oxygen, Diffusion, Optical lithography, Electronics

Proceedings Article | 1 August 1991 Paper
Akio Misaka, Kazuhiko Hashimoto, M. Kawamoto, H. Yamashita, Takahiro Matsuo, Toshihiko Sakashita, Kenji Harafuji, Noboru Nomura
Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47354
KEYWORDS: X-ray lithography, X-rays, Manufacturing, Scattering, Ion beams, Lithography, Electron beams, Modulation, Data processing, Absorption

Showing 5 of 20 publications
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