Mr. Wei-Hsin Chein Profile

Wei-Hsin Chein

at National Taiwan Univ

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Author

Publications (5)

Proceedings Article | 18 June 2024 Presentation + Paper

Advancements in metrology for advanced semiconductor packaging

Wei-Hsin Chein, Gaurav Pandey, Surajit Das, Liang-Chia Chen

Proceedings Volume 12997, 129970R (2024) https://doi.org/10.1117/12.3024745

KEYWORDS: Metrology, Advanced packaging, 3D metrology, Scanning electron microscopy, X-rays, Atomic force microscopy, Silicon, X-ray microscopy, Semiconductors, Overlay metrology

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Proceedings Article | 10 April 2024 Poster + Paper

AI-powered deconvolution-based super-resolution imaging for semiconductor OCD metrology and precise stage positioning

Yu-Ting Cheng, Wei-Yun Lee, Ming-Jie Liu, Wei-Hsin Chein, Liang-Chia Chen

Proceedings Volume 12955, 129553D (2024) https://doi.org/10.1117/12.3010986

KEYWORDS: Point spread functions, Image processing, Image deconvolution, Deconvolution, Systems modeling, Resolution enhancement technologies, Super resolution, Scanning electron microscopy, Image enhancement, Semiconductors

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Proceedings Article | 10 August 2023 Presentation + Paper

Non-integral model-based scatterometry for single-structure OCD metrology

Wei-Hsin Chein, Fu-Sheng Yang, Zi-Ying Fu, Liang-Chia Chen

Proceedings Volume 12619, 126190H (2023) https://doi.org/10.1117/12.2673318

KEYWORDS: Model-based design, Scatterometry, Metrology, Critical dimension metrology, Beam shaping, Diffraction

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Proceedings Article | 27 April 2023 Presentation + Paper

Artificial-neural-network-assisted DUV scatterometry for OCD on HAR sub-micron structures

Zih-Ying Fu, Wei-Hsin Chein, Fu-Sheng Yang, Liang-Chia Chen

Proceedings Volume 12496, 124960E (2023) https://doi.org/10.1117/12.2657642

KEYWORDS: Artificial neural networks, Scatterometry, Deep ultraviolet, Data modeling, Scanning electron microscopy, Particle swarm optimization, Systems modeling, Reflection, Finite-difference time-domain method, Statistical modeling

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Proceedings Article | 24 May 2022 Presentation + Paper

New critical dimension optical metrology for submicron high-aspect-ratio structures using spectral reflectometry with supercontinuum laser illumination

Wei-Hsin Chein, Fu-Sheng Yang, Komal Thakur, Guo-Wei Wu, Liang-Chia Chen

Proceedings Volume 12137, 121370E (2022) https://doi.org/10.1117/12.2621895

KEYWORDS: Reflectometry, Spectroscopy, Scanning electron microscopy, Laser metrology, Image processing, Optical metrology, Etching, Critical dimension metrology, Objectives, Laser sources

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